Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability

Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability

US Patent 11289312 · Granted Mar 29, 2022

Estimated economic value: $46,373,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reduced substrate process chamber cavity volume2025
Methods and apparatus for wafer detection2025
Plasma chamber with gas cross-flow, microwave resonators and a rotatable pedesta2025
Plasma chamber with gas cross-flow, microwave resonators and a rotatable pedesta2025
Substrate processing module and method of moving a workpiece2025
Apparatus for controlling lift pin movement2025
Ammonia-rich combustion coupled dual-mode prechamber ammonia-fueled engine contr2025
Molybdenum monolithic physical vapor deposition target2025
Automated part inspection system2025
Directional selective junction clean with field polymer protections2025
Directional selective junction clean with field polymer protections2025
Capacitive sensors and capacitive sensing locations for plasma chamber condition2025