AA

Adolph Miller Allen

Applied Materials: 40 patents #230 of 7,310Top 4%
RR Read Rite: 1 patents #138 of 240Top 60%
VA Varian Semiconductor Equipment Associates: 1 patents #304 of 513Top 60%
Overall (All Time): #72,347 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 25 most recent of 42 patents

Patent #TitleCo-InventorsDate
12368024 Methods and apparatus for processing a substrate Abdullah Zafar, William J. Durand, Xinyuan Chong, Kenric Choi, Weize Hu +4 more 2025-07-22
12136544 Etch uniformity improvement for single turn internal coil PVD chamber Anthony Chih-Tung Chan, Mehul Chauhan, Goichi Yoshidome 2024-11-05
12112890 Top magnets for decreased non-uniformity in PVD Borui Xia, Anthony Chih-Tung Chan, Shiyu YUE, Wei-Sheng Lei, Aravind Kamath +2 more 2024-10-08
12094699 Methods and apparatus for controlling ion fraction in physical vapor deposition processes Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, Keith A. Miller +4 more 2024-09-17
11932934 Method for particle removal from wafers through plasma modification in pulsed PVD Halbert Chong, Lei Zhou, Vaibhav Soni, Kishor Kalathiparambil, Vanessa Faune +1 more 2024-03-19
11935732 Process kit geometry for particle reduction in PVD processes Kirankumar Neelasandra SAVANDAIAH, Randal Dean Schmieding, Vanessa Faune 2024-03-19
11835927 Reducing substrate surface scratching using machine learning Kartik Shah, Satish Radhakrishnan, Karthik Ramanathan, Karthikeyan Balaraman, Xinyuan Chong +5 more 2023-12-05
11810770 Methods and apparatus for controlling ion fraction in physical vapor deposition processes Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, Keith A. Miller +4 more 2023-11-07
11658016 Shield for a substrate processing chamber Kathleen Scheible, Michael Allen Flanigan, Goichi Yoshidome, Cristopher M. Pavloff 2023-05-23
11586160 Reducing substrate surface scratching using machine learning Kartik Shah, Satish Radhakrishnan, Karthik Ramanathan, Karthikeyan Balaraman, Xinyuan Chong +5 more 2023-02-21
11473189 Method for particle removal from wafers through plasma modification in pulsed PVD Halbert Chong, Lei Zhou, Vaibhav Soni, Kishor Kalathiparambil, Vanessa Faune +1 more 2022-10-18
11289312 Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability Vanessa Faune, Zhong Qiang Hua, Kirankumar Neelasandra SAVANDAIAH, Anantha K. Subramani, Philip Allan Kraus +5 more 2022-03-29
11289329 Methods and apparatus for filling a feature disposed in a substrate Rui Li, Xiangjin Xie, Fuhong Zhang, Shirish A. PETHE, Lanlan Zhong +1 more 2022-03-29
11049701 Biased cover ring for a substrate processing system William Johanson, Viachslav Babayan, Zhong Qiang Hua, Carl Johnson, Vanessa Faune +4 more 2021-06-29
11037768 Methods and apparatus for controlling ion fraction in physical vapor deposition processes Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, Keith A. Miller +4 more 2021-06-15
10972280 Blockchain for distributed authentication of hardware operating profile Paul Kiely, Noufal Kappachali 2021-04-06
10858727 High density, low stress amorphous carbon film, and process and equipment for its deposition Jingjing Liu, Zhong Qiang Hua, Michael W. Stowell, Srinivas D. Nemani, Chentsau Ying +3 more 2020-12-08
10811257 Techniques for forming low stress etch-resistant mask using implantation Rajesh Prasad, Tzu-Yu Liu, Kyu-Ha Shim, Tom Ho Wing Yu, Zhong Qiang Hua +3 more 2020-10-20
10763090 High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process Lara Hawrylchak, Zhigang Xie, Muhammad M. Rasheed, Rongjun Wang, Xianmin Tang +8 more 2020-09-01
10563304 Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambers Xiangjin Xie, Xianmin Tang, Goichi Yoshidome 2020-02-18
10541169 Method and system for balancing the electrostatic chucking force on a substrate Chong Jiang, Lei Jing, Mingte Liu, Michael W. Johnson, Pallavi Zhang +1 more 2020-01-21
10400327 Counter based time compensation to reduce process shifting in reactive magnetron sputtering reactor Mohammad Kamruzzaman Chowdhury, Zhenbin Ge 2019-09-03
10347475 Holding assembly for substrate processing chamber Kathleen Scheible, Michael Allen Flanigan, Goichi Yoshidome, Christopher Pavloff 2019-07-09
10283334 Methods and apparatus for maintaining low non-uniformity over target life William Johanson, Fuhong Zhang, Yu Liu 2019-05-07
10283345 Methods for pre-cleaning conductive materials on a substrate Xiangjin Xie, Feng Q. Liu, Daping Yao, Alexander Jansen, Joung Joo Lee +2 more 2019-05-07