Issued Patents All Time
Showing 25 most recent of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12057329 | Selective etch using material modification and RF pulsing | Bhargav S. Citla, Srinivas D. Nemani, Viachslav Babayan, Michael W. Stowell | 2024-08-06 |
| 11114333 | Method for depositing and reflow of a high quality etch resistant gapfill dielectric film | Srinivas D. Nemani, Ellie Yieh | 2021-09-07 |
| 11056406 | Stack of multiple deposited semiconductor layers | Liyan Miao, Xinhai Han, Long-Shih Lin | 2021-07-06 |
| 10964527 | Residual removal | Jong Mun Kim, Biao Liu, Cheng Pan, Erica Chen, Srinivas D. Nemani +1 more | 2021-03-30 |
| 10858727 | High density, low stress amorphous carbon film, and process and equipment for its deposition | Jingjing Liu, Zhong Qiang Hua, Adolph Miller Allen, Michael W. Stowell, Srinivas D. Nemani +3 more | 2020-12-08 |
| 10570506 | Method to improve film quality for PVD carbon with reactive gas and bias power | Bhargav S. Citla, Jingjing Liu, Zhong Qiang Hua, Srinivas D. Nemani, Ellie Yieh | 2020-02-25 |
| 10490467 | Methods of forming a stack of multiple deposited semiconductor layers | Liyan Miao, Xinhai Han, Long-Shih Lin | 2019-11-26 |
| 10249495 | Diamond like carbon layer formed by an electron beam plasma process | Yang Yang, Lucy Chen, Jie Zhou, Kartik Ramaswamy, Kenneth S. Collins +5 more | 2019-04-02 |
| 9865484 | Selective etch using material modification and RF pulsing | Bhargav S. Citla, Srinivas D. Nemani, Viachslav Babayan, Michael W. Stowell | 2018-01-09 |
| 9865464 | Nanocrystalline diamond carbon film for 3D NAND hardmask application | Yongmei Chen, Christopher S. Ngai, Jingjing Liu, Jun Xue, Ludovic Godet | 2018-01-09 |
| 9852916 | Single platform, multiple cycle spacer deposition and etch | Hao Chen, Srinivas D. Nemani, Ellie Yieh | 2017-12-26 |
| 9640385 | Gate electrode material residual removal process | Bhargav S. Citla, Srinivas D. Nemani | 2017-05-02 |
| 9502262 | Nanocrystalline diamond carbon film for 3D NAND hardmask application | Yongmei Chen, Christopher S. Ngai, Jingjing Liu, Jun Xue, Ludovic Godet | 2016-11-22 |
| 9484202 | Apparatus and methods for spacer deposition and selective removal in an advanced patterning process | Jie Zhou, Shambhu N. Roy, Srinivas D. Nemani, Jingjing Liu, Ellie Yieh | 2016-11-01 |
| 9406522 | Single platform, multiple cycle spacer deposition and etch | Hao Chen, Srinivas D. Nemani, Ellie Yieh | 2016-08-02 |
| 9382625 | Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition | Jun Xue, Jingjing Liu, Yongmei Chen, Ludovic Godet, Shambhu N. Roy | 2016-07-05 |
| 9190290 | Halogen-free gas-phase silicon etch | Jun Xue, Srinivas D. Nemani | 2015-11-17 |
| 7320942 | Method for removal of metallic residue after plasma etching of a metal layer | Xiaoyi Chen, Padmapani Nallan, Ajay Kumar, Ralph Kerns, Ying Rui +3 more | 2008-01-22 |
| 7105361 | Method of etching a magnetic material | Xiaoyi Chen, Padmapani Nallan, Ajay Kumar | 2006-09-12 |
| 6984585 | Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer | Xiaoyi Chen, Padmapani Nallan, Ajay Kumar | 2006-01-10 |
| 6964928 | Method for removing residue from a magneto-resistive random access memory (MRAM) film stack using a dual mask | Xiaoyi Chen, Padmapani Nallan, Ajay Kumar | 2005-11-15 |
| 6942813 | Method of etching magnetic and ferroelectric materials using a pulsed bias source | Padmapani Nallan, Ajay Kumar, Xiaoyi Chen | 2005-09-13 |
| 6943039 | Method of etching ferroelectric layers | Padmapani Nallan, Ajay Kumar | 2005-09-13 |
| 6933239 | Method for removing conductive residue | Xiaoyi Chen, Chun Yan, Ajay Kumar | 2005-08-23 |
| 6919168 | Masking methods and etching sequences for patterning electrodes of high density RAM capacitors | Jeng H. Hwang, Steve S. Y. Mak, True-Lon Lin, John W. Schaller | 2005-07-19 |