Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12057329 | Selective etch using material modification and RF pulsing | Bhargav S. Citla, Chentsau Ying, Srinivas D. Nemani, Michael W. Stowell | 2024-08-06 |
| 11899366 | Method and apparatus for post exposure processing of photoresist wafers | Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2024-02-13 |
| 11550224 | Apparatus for post exposure bake | Kyle M. Hanson, Gregory J. Wilson | 2023-01-10 |
| 11262662 | Post exposure processing apparatus | Ludovic Godet, Kyle M. Hanson, Robert B. Moore | 2022-03-01 |
| 11112697 | Method and apparatus for post exposure processing of photoresist wafers | Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2021-09-07 |
| 11094573 | Method and apparatus for thin wafer carrier | Jingyu Qiao, Qiwei Liang, Seshadri Ramaswami, Srinivas D. Nemani | 2021-08-17 |
| 11049701 | Biased cover ring for a substrate processing system | Adolph Miller Allen, William Johanson, Zhong Qiang Hua, Carl Johnson, Vanessa Faune +4 more | 2021-06-29 |
| 10954594 | High temperature vapor delivery system and method | Qiwei Liang, Tobin Kaufman-Osborn, Ludovic Godet, Srinivas D. Nemani | 2021-03-23 |
| 10858727 | High density, low stress amorphous carbon film, and process and equipment for its deposition | Jingjing Liu, Zhong Qiang Hua, Adolph Miller Allen, Michael W. Stowell, Srinivas D. Nemani +3 more | 2020-12-08 |
| 10845715 | Post exposure processing apparatus | Ludovic Godet, Kyle M. Hanson, Robert B. Moore | 2020-11-24 |
| 10754252 | Apparatus for post exposure bake | Kyle M. Hanson, Gregory J. Wilson | 2020-08-25 |
| 10615058 | Apparatus for field guided acid profile control in a photoresist layer | Ludovic Godet, Christine Y Ouyang | 2020-04-07 |
| 10566177 | Pulse shape controller for sputter sources | Michael W. Stowell, Jingjing Liu, Zhong Qiang Hua | 2020-02-18 |
| 10474033 | Method and apparatus for post exposure processing of photoresist wafers | Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-11-12 |
| 10401742 | Post exposure processing apparatus | Ludovic Godet, Kyle M. Hanson, Robert B. Moore | 2019-09-03 |
| 10203604 | Method and apparatus for post exposure processing of photoresist wafers | Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-02-12 |
| 9964863 | Post exposure processing apparatus | Ludovic Godet, Kyle M. Hanson, Robert B. Moore | 2018-05-08 |
| 9958782 | Apparatus for post exposure bake | Kyle M. Hanson, Gregory J. Wilson | 2018-05-01 |
| 9865484 | Selective etch using material modification and RF pulsing | Bhargav S. Citla, Chentsau Ying, Srinivas D. Nemani, Michael W. Stowell | 2018-01-09 |
| 9829790 | Immersion field guided exposure and post-exposure bake process | Douglas A. Buchberger, Jr., Sang Ki Nam, Christine Y Ouyang, Ludovic Godet, Srinivas D. Nemani | 2017-11-28 |