| 12057329 |
Selective etch using material modification and RF pulsing |
Bhargav S. Citla, Chentsau Ying, Srinivas D. Nemani, Michael W. Stowell |
2024-08-06 |
$90,312,000 |
| 11899366 |
Method and apparatus for post exposure processing of photoresist wafers |
Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more |
2024-02-13 |
$47,589,000 |
| 11550224 |
Apparatus for post exposure bake |
Kyle M. Hanson, Gregory J. Wilson |
2023-01-10 |
$38,290,000 |
| 11262662 |
Post exposure processing apparatus |
Ludovic Godet, Kyle M. Hanson, Robert B. Moore |
2022-03-01 |
$41,046,000 |
| 11112697 |
Method and apparatus for post exposure processing of photoresist wafers |
Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more |
2021-09-07 |
$49,370,000 |
| 11094573 |
Method and apparatus for thin wafer carrier |
Jingyu Qiao, Qiwei Liang, Seshadri Ramaswami, Srinivas D. Nemani |
2021-08-17 |
$63,158,000 |
| 11049701 |
Biased cover ring for a substrate processing system |
Adolph Miller Allen, William Johanson, Zhong Qiang Hua, Carl Johnson, Vanessa Faune +4 more |
2021-06-29 |
$47,858,000 |
| 10954594 |
High temperature vapor delivery system and method |
Qiwei Liang, Tobin Kaufman-Osborn, Ludovic Godet, Srinivas D. Nemani |
2021-03-23 |
$48,969,000 |
| 10858727 |
High density, low stress amorphous carbon film, and process and equipment for its deposition |
Jingjing Liu, Zhong Qiang Hua, Adolph Miller Allen, Michael W. Stowell, Srinivas D. Nemani +3 more |
2020-12-08 |
$52,028,000 |
| 10845715 |
Post exposure processing apparatus |
Ludovic Godet, Kyle M. Hanson, Robert B. Moore |
2020-11-24 |
$38,395,000 |
| 10754252 |
Apparatus for post exposure bake |
Kyle M. Hanson, Gregory J. Wilson |
2020-08-25 |
$29,525,000 |
| 10615058 |
Apparatus for field guided acid profile control in a photoresist layer |
Ludovic Godet, Christine Y Ouyang |
2020-04-07 |
$24,481,000 |
| 10566177 |
Pulse shape controller for sputter sources |
Michael W. Stowell, Jingjing Liu, Zhong Qiang Hua |
2020-02-18 |
$26,722,000 |
| 10474033 |
Method and apparatus for post exposure processing of photoresist wafers |
Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more |
2019-11-12 |
$41,829,000 |
| 10401742 |
Post exposure processing apparatus |
Ludovic Godet, Kyle M. Hanson, Robert B. Moore |
2019-09-03 |
$20,988,000 |
| 10203604 |
Method and apparatus for post exposure processing of photoresist wafers |
Douglas A. Buchberger, Jr., Qiwei Liang, Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more |
2019-02-12 |
$37,465,000 |
| 9964863 |
Post exposure processing apparatus |
Ludovic Godet, Kyle M. Hanson, Robert B. Moore |
2018-05-08 |
$79,246,000 |
| 9958782 |
Apparatus for post exposure bake |
Kyle M. Hanson, Gregory J. Wilson |
2018-05-01 |
$18,276,000 |
| 9865484 |
Selective etch using material modification and RF pulsing |
Bhargav S. Citla, Chentsau Ying, Srinivas D. Nemani, Michael W. Stowell |
2018-01-09 |
$16,545,000 |
| 9829790 |
Immersion field guided exposure and post-exposure bake process |
Douglas A. Buchberger, Jr., Sang Ki Nam, Christine Y Ouyang, Ludovic Godet, Srinivas D. Nemani |
2017-11-28 |
$20,834,000 |
