Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12379665 | Method for removing resist layer, method of forming a pattern and method of manufacturing a package | — | 2025-08-05 |
| 12327721 | Ultraviolet radiation activated atomic layer deposition | Ziwei Fang | 2025-06-10 |
| 12111576 | Extreme ultraviolet photolithography method with infiltration for enhanced sensitivity and etch resistance | — | 2024-10-08 |
| 12013645 | Method for removing resist layer, method of forming a pattern and method of manufacturing a package | — | 2024-06-18 |
| 11908701 | Patterning method and manufacturing method of semiconductor device | Li-Te Lin | 2024-02-20 |
| 11545370 | Method for forming pattern and manufacturing method of package | — | 2023-01-03 |
| 11487207 | Extreme ultraviolet photolithography method with infiltration for enhanced sensitivity and etch resistance | — | 2022-11-01 |
| 11307500 | Method for removing photoresistor layer, method of forming a pattern and method of manufacturing a package | — | 2022-04-19 |
| 11211244 | Ultraviolet radiation activated atomic layer deposition | Ziwei Fang | 2021-12-28 |
| 11201060 | Structure and formation method of semiconductor device with metal gate stack | Ziwei Fang | 2021-12-14 |
| 11087984 | Selective deposition by laser heating for forming a semiconductor structure | — | 2021-08-10 |
| 10861706 | Etch selectivity improved by laser beam | Li-Te Lin | 2020-12-08 |
| 10845704 | Extreme ultraviolet photolithography method with infiltration for enhanced sensitivity and etch resistance | — | 2020-11-24 |
| 10615058 | Apparatus for field guided acid profile control in a photoresist layer | Ludovic Godet, Viachslav Babayan | 2020-04-07 |
| 10157740 | Selective deposition process utilizing polymer structure deactivation process | Ludovic Godet | 2018-12-18 |
| 10048589 | Field guided post exposure bake application for photoresist microbridge defects | Ludovic Godet, Sang Ki Nam | 2018-08-14 |
| 9996006 | Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake | Sang Ki Nam, Ludovic Godet | 2018-06-12 |
| 9927709 | Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake | Sang Ki Nam, Ludovic Godet | 2018-03-27 |
| 9864276 | Laser annealing and electric field | Ludovic Godet, Sang Ki Nam | 2018-01-09 |
| 9829790 | Immersion field guided exposure and post-exposure bake process | Douglas A. Buchberger, Jr., Sang Ki Nam, Viachslav Babayan, Ludovic Godet, Srinivas D. Nemani | 2017-11-28 |
| 9823570 | Field guided post exposure bake application for photoresist microbridge defects | Ludovic Godet, Sang Ki Nam | 2017-11-21 |