KC

Kenneth S. Collins

Applied Materials: 235 patents #2 of 7,310Top 1%
Overall (All Time): #2,258 of 4,157,543Top 1%
238
Patents All Time

Issued Patents All Time

Showing 25 most recent of 238 patents

Patent #TitleCo-InventorsDate
12334383 Substrate support gap pumping to prevent glow discharge and light-up James D. Carducci, Michael R. Rice, Kartik Ramaswamy, Silverst Rodrigues, Yang Yang 2025-06-17
12163218 Continuous liner for use in a processing chamber James D. Carducci, Kartik Ramaswamy 2024-12-10
11935724 Symmetric VHF source for a plasma reactor Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Shahid Rauf +3 more 2024-03-19
11814724 Continuous liner for use in a processing chamber James D. Carducci, Kartik Ramaswamy 2023-11-14
11651966 Methods and apparatus for processing a substrate Kartik Ramaswamy, Yang Yang, Steven Lane, Gonzalo Monroy, Yue Guo 2023-05-16
11587766 Symmetric VHF source for a plasma reactor Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Shahid Rauf +3 more 2023-02-21
11499223 Continuous liner for use in a processing chamber James D. Carducci, Kartik Ramaswamy 2022-11-15
11424104 Plasma reactor with electrode filaments extending from ceiling Michael R. Rice, Kartik Ramaswamy, James D. Carducci 2022-08-23
11373882 Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu 2022-06-28
11355321 Plasma reactor with electrode assembly for moving substrate Michael R. Rice, Kartik Ramaswamy, James D. Carducci 2022-06-07
11315760 Symmetric plasma process chamber James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more 2022-04-26
11114284 Plasma reactor with electrode array in ceiling Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Kallol Bera 2021-09-07
11101113 Ion-ion plasma atomic layer etch process Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Leonid Dorf, Yang Yang 2021-08-24
11043387 Methods and apparatus for processing a substrate Kartik Ramaswamy, Yang Yang, Steven Lane, Gonzalo Monroy, Yue Guo 2021-06-22
11043375 Plasma deposition of carbon hardmask Yang Yang, Eswaranand Venkatasubramanian, Kartik Ramaswamy, Steven Lane, Gonzalo Monroy +2 more 2021-06-22
11043361 Symmetric VHF source for a plasma reactor Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Shahid Rauf +3 more 2021-06-22
11043360 Gas distribution plate assembly for high power plasma etch processes James D. Carducci, Kartik Ramaswamy, Michael R. Rice, Richard Fovell, Vijay D. Parkhe 2021-06-22
10847386 Method of forming a bulk article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu 2020-11-24
10840113 Method of forming a coated article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu 2020-11-17
10840112 Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu 2020-11-17
10811226 Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates James D. Carducci, Richard Fovell, Jason A. Kenney, Kartik Ramaswamy, Shahid Rauf 2020-10-20
10790153 Methods and apparatus for electron beam etching process Yue Guo, Yang Yang, Kartik Ramaswamy, Steven Lane, Gonzalo Monroy +1 more 2020-09-29
10784085 Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber Kartik Ramaswamy, Steven Lane, Yang Yang, Lawrence Wong 2020-09-22
10770269 Apparatus and methods for reducing particles in semiconductor process chambers Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom Choi +3 more 2020-09-08
10707086 Etching methods Yang Yang, Kartik Ramaswamy, Steven Lane, Gonzalo Monroy, Lucy Chen +1 more 2020-07-07