Issued Patents All Time
Showing 26–50 of 238 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10622194 | Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance | Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu | 2020-04-14 |
| 10615006 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-04-07 |
| 10615004 | Distributed electrode array for plasma processing | Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Yue Guo, Olga Regelman | 2020-04-07 |
| 10580620 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-03-03 |
| 10546728 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-01-28 |
| 10544505 | Deposition or treatment of diamond-like carbon in a plasma reactor | Yang Yang, Kartik Ramaswamy, Steven Lane, Gonzalo Monroy, Lucy Chen +1 more | 2020-01-28 |
| 10535502 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-01-14 |
| 10510515 | Processing tool with electrically switched electrode assembly | Kartik Ramaswamy, Shahid Rauf, Kallol Bera, James D. Carducci, Michael R. Rice +1 more | 2019-12-17 |
| 10475626 | Ion-ion plasma atomic layer etch process and reactor | Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Leonid Dorf, Yang Yang | 2019-11-12 |
| 10453656 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2019-10-22 |
| 10418225 | Distributed electrode array for plasma processing | Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Yue Guo, Olga Regelman | 2019-09-17 |
| 10373807 | Distributed electrode array for plasma processing | Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Yue Guo, Olga Regelman | 2019-08-06 |
| 10312056 | Distributed electrode array for plasma processing | Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Yue Guo, Olga Regelman | 2019-06-04 |
| 10249470 | Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding | Jason A. Kenney, James D. Carducci, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2019-04-02 |
| 10249495 | Diamond like carbon layer formed by an electron beam plasma process | Yang Yang, Lucy Chen, Jie Zhou, Kartik Ramaswamy, Srinivas D. Nemani +5 more | 2019-04-02 |
| 10242888 | Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance | Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu | 2019-03-26 |
| 10242847 | Plasma processing apparatus and liner assembly for tuning electrical skews | James D. Carducci, Zhigang Chen, Shahid Rauf | 2019-03-26 |
| 10170279 | Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding | Jason A. Kenney, James D. Carducci, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2019-01-01 |
| 10157731 | Semiconductor processing apparatus with protective coating including amorphous phase | Jennifer Y. Sun, Ren-Guan Duan | 2018-12-18 |
| 10153139 | Multiple electrode substrate support assembly and phase control system | Yang Yang, Kartik Ramaswamy, Steven Lane, Lawrence Wong, Shahid Rauf +2 more | 2018-12-11 |
| 10131994 | Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow | Andrew Nguyen, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more | 2018-11-20 |
| 9960776 | Method and apparatus for generating a variable clock used to control a component of a substrate processing system | Satoru Kobayashi, Kartik Ramaswamy | 2018-05-01 |
| 9928987 | Inductively coupled plasma source with symmetrical RF feed | Jason A. Kenney, James D. Carducci, Richard Fovell, Kartik Ramaswamy, Shahid Rauf | 2018-03-27 |
| 9896769 | Inductively coupled plasma source with multiple dielectric windows and window-supporting structure | Andrew Nguyen, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more | 2018-02-20 |
| 9896376 | Ceramic component formed ceramic portions bonded together with a halogen plasma resistant bonding agent | Jennifer Y. Sun, Ren-Guan Duan | 2018-02-20 |