Issued Patents All Time
Showing 51–75 of 238 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9870897 | Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates | James D. Carducci, Richard Fovell, Jason A. Kenney, Kartik Ramaswamy, Shahid Rauf | 2018-01-16 |
| 9824862 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Shahid Rauf +3 more | 2017-11-21 |
| 9799491 | Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching | Leonid Dorf, Shahid Rauf, Kartik Ramaswamy, James D. Carducci, Hamid Tavassoli +2 more | 2017-10-24 |
| 9761416 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom K. Cho +3 more | 2017-09-12 |
| 9745663 | Symmetrical inductively coupled plasma source with symmetrical flow chamber | Andrew Nguyen, Kartik Ramaswamy, Shahid Rauf, James D. Carducci, Douglas A. Buchberger, Jr. +5 more | 2017-08-29 |
| 9741546 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2017-08-22 |
| 9721760 | Electron beam plasma source with reduced metal contamination | Leonid Dorf, Shahid Rauf, Kartik Ramaswamy, Nipun Misra, Gonzalo Monroy +2 more | 2017-08-01 |
| 9721757 | Elongated capacitively coupled plasma source for high temperature low pressure environments | John C. Forster, Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin +1 more | 2017-08-01 |
| 9564297 | Electron beam plasma source with remote radical source | Ming-Feng Wu, Leonid Dorf, Shahid Rauf, Ying Zhang, Hamid Tavassoli +2 more | 2017-02-07 |
| 9449794 | Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna | Andrew Nguyen, Kartik Ramaswamy, Jason A. Kenney, Shahid Rauf, Yang Yang +2 more | 2016-09-20 |
| 9443700 | Electron beam plasma source with segmented suppression electrode for uniform plasma generation | Leonid Dorf, Shahid Rauf, Nipun Misra, Kartik Ramaswamy, James D. Carducci +1 more | 2016-09-13 |
| 9412563 | Spatially discrete multi-loop RF-driven plasma source having plural independent zones | Kartik Ramaswamy, Shahid Rauf, Steven Lane, Yang Yang, Lawrence Wong | 2016-08-09 |
| 9355819 | Elongated capacitively coupled plasma source for high temperature low pressure environments | John C. Forster, Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin +1 more | 2016-05-31 |
| 9330887 | Plasma reactor with tiltable overhead RF inductive source | Andrew Nguyen, Martin Jeffrey Salinas, Imad Yousif, Ming Xu | 2016-05-03 |
| 9312106 | Digital phase controller for two-phase operation of a plasma reactor | Satoru Kobayashi, Kartik Ramaswamy, Shahid Rauf | 2016-04-12 |
| 9269546 | Plasma reactor with electron beam plasma source having a uniform magnetic field | Ming-Feng Wu, Ajit Balakrishna, Leonid Dorf, Shahid Rauf, Nipun Misra | 2016-02-23 |
| 9161428 | Independent control of RF phases of separate coils of an inductively coupled plasma reactor | Satoru Kobayashi, Lawrence Wong, Jonathan Liu, Yang Yang, Kartik Ramaswamy +1 more | 2015-10-13 |
| 9129777 | Electron beam plasma source with arrayed plasma sources for uniform plasma generation | Leonid Dorf, Shahid Rauf, Nipun Misra, James D. Carducci, Gary Leray +1 more | 2015-09-08 |
| 9111722 | Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator | Leonid Dorf, Shahid Rauf, Jonathan Liu, Jason A. Kenney, Andrew Nguyen +2 more | 2015-08-18 |
| 9082591 | Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator | Leonid Dorf, Shahid Rauf, Jonathan Liu, Jason A. Kenney, Andrew Nguyen +2 more | 2015-07-14 |
| 9082590 | Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates | James D. Carducci, Richard Fovell, Jason A. Kenney, Kartik Ramaswamy, Shahid Rauf | 2015-07-14 |
| 9051219 | Semiconductor processing apparatus comprising a solid solution ceramic formed from yttrium oxide, zirconium oxide, and aluminum oxide | Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu | 2015-06-09 |
| 9017765 | Protective coatings resistant to reactive plasma processing | Jennifer Y. Sun, Ren-Guan Duan | 2015-04-28 |
| 8951384 | Electron beam plasma source with segmented beam dump for uniform plasma generation | Leonid Dorf, Shahid Rauf, Nipun Misra, James D. Carducci, Gary Leray +1 more | 2015-02-10 |
| 8920597 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Shahid Rauf +3 more | 2014-12-30 |