Issued Patents All Time
Showing 76–100 of 238 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8900405 | Plasma immersion ion implantation reactor with extended cathode process ring | Peter I. Porshnev, Majeed A. Foad, Kartik Ramaswamy, Biagio Gallo, Hiroji Hanawa +2 more | 2014-12-02 |
| 8894805 | Electron beam plasma source with profiled magnet shield for uniform plasma generation | Kallol Bera, Shahid Rauf, Leonid Dorf, Ajit Balakrishna, Gary Leray | 2014-11-25 |
| 8878926 | Apparatus and method for analyzing thermal properties of composite structures | Zheng John Ye, Kartik Ramaswamy, Troy S. Detrick | 2014-11-04 |
| 8871312 | Method of reducing plasma arcing on surfaces of semiconductor processing apparatus components in a plasma processing chamber | Jennifer Y. Sun, Ren-Guan Duan, Senh Thach, Thomas Graves, Xiaoming He +1 more | 2014-10-28 |
| 8858745 | Corrosion-resistant bonding agents for bonding ceramic components which are exposed to plasmas | Jennifer Y. Sun, Ren-Guan Duan | 2014-10-14 |
| 8758858 | Method of producing a plasma-resistant thermal oxide coating | Jennifer Y. Sun, Li Xu, Thomas Graves, Ren-Guan Duan, Senh Thach | 2014-06-24 |
| 8734664 | Method of differential counter electrode tuning in an RF plasma reactor | Yang Yang, Kartik Ramaswamy, Steven Lane, Douglas A. Buchberger, Jr., Lawrence Wong +1 more | 2014-05-27 |
| 8721798 | Methods for processing substrates in process systems having shared resources | James P. Cruse, Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz +3 more | 2014-05-13 |
| 8652297 | Symmetric VHF plasma power coupler with active uniformity steering | Zhigang Chen, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Andrew Nguyen | 2014-02-18 |
| 8623527 | Semiconductor processing apparatus comprising a coating formed from a solid solution of yttrium oxide and zirconium oxide | Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu | 2014-01-07 |
| 8578879 | Apparatus for VHF impedance match tuning | Kartik Ramaswamy, Hiroji Hanawa, Lawrence Wong, Samer Banna, Andrew Nguyen | 2013-11-12 |
| 8496756 | Methods for processing substrates in process systems having shared resources | James P. Cruse, Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz +3 more | 2013-07-30 |
| 8414736 | Plasma reactor with tiltable overhead RF inductive source | Andrew Nguyen, Martin Jeffrey Salinas, Imad Yousif, Ming Xu | 2013-04-09 |
| 8398814 | Tunable gas flow equalizer | Ajit Balakrishna, Jason A. Kenney, Andrew Nguyen | 2013-03-19 |
| 8382999 | Pulsed plasma high aspect ratio dielectric process | Ankur Agarwal, Shahid Rauf, Kartik Ramaswamy, Thorsten Lill | 2013-02-26 |
| 8367227 | Plasma-resistant ceramics with controlled electrical resistivity | Jennifer Y. Sun, Ren-Guan Duan, Senh Thach, Thomas Graves, Xiaoming He +1 more | 2013-02-05 |
| 8357264 | Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator | Steven C. Shannon, Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller | 2013-01-22 |
| 8337661 | Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator | Steven C. Shannon, Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller | 2012-12-25 |
| 8324525 | Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator | Steven C. Shannon, Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller | 2012-12-04 |
| 8313664 | Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber | Zhigang Chen, Shahid Rauf, Walter R. Merry, Leonid Dorf, Kartik Ramaswamy | 2012-11-20 |
| 8129029 | Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating | Jennifer Y. Sun, Li Xu, Thomas Graves, Ren-Guan Duan, Senh Thach | 2012-03-06 |
| 8080479 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-12-20 |
| 8076247 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-12-13 |
| 8058156 | Plasma immersion ion implantation reactor having multiple ion shower grids | Hiroji Hanawa, Tsutomu Tanaka, Amir Al-Bayati, Kartik Ramaswamy, Andrew Nguyen | 2011-11-15 |
| 8034734 | Semiconductor processing apparatus which is formed from yttrium oxide and zirconium oxide to produce a solid solution ceramic apparatus | Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu | 2011-10-11 |