Issued Patents All Time
Showing 1–25 of 339 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D1081569 | Servo amplifier | Hiroyuki Kato, Shinichi Kato, Asuna Osawa, Masaaki Kadoyanagi, Shotaro Hirako +1 more | 2025-07-01 |
| D1076807 | Servo amplifier | Hiroyuki Kato, Shinichi Kato, Asuna Osawa, Masaaki Kadoyanagi, Shotaro Hirako +1 more | 2025-05-27 |
| 12288677 | Vertically adjustable plasma source | Jared Ahmad Lee, Rakesh Ramadas, Dmitry A. Dzilno, Gregory J. Wilson, Sriharish Srinivasan | 2025-04-29 |
| 12224156 | Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool | Xiaopu Li, Jozef Kudela, Kallol Bera, Dmitry A. Dzilno | 2025-02-11 |
| 12205845 | Semiconductor processing chamber to accommodate parasitic plasma formation | Khokan Chandra Paul, Adam J. Fischbach, Abhijit A. Kangude, Juan Carlos Rocha-Alvarez | 2025-01-21 |
| 12195851 | Thin layer deposition with plasma pulsing | Cong Trinh, Maribel Maldonado-Garcia, Mihaela Balseanu, Alexander V. Garachtchenko | 2025-01-14 |
| D1053695 | Servo amplifier | Hiroyuki Kato, Shinichi Kato, Asuna Osawa, Masaaki Kadoyanagi, Shotaro Hirako +1 more | 2024-12-10 |
| 12142459 | Single chamber flowable film formation and treatments | Khokan Chandra Paul, Adam J. Fischbach, Canfeng Lai | 2024-11-12 |
| 11923172 | Paired dynamic parallel plate capacitively coupled plasmas | Hari Ponnekanti, Mandyam Sriram, Dmitry A. Dzilno, Sanjeev Baluja, Mario David Silvetti | 2024-03-05 |
| 11887818 | Methods and systems to modulate film stress | John C. Forster, Ran Liu, Kenichi Ohno, Ning Li, Mihaela Balseanu +2 more | 2024-01-30 |
| 11823871 | Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool | Jozef Kudela, Alexander V. Garachtchenko, Dmitry A. Dzilno, Avinash Shervegar, Kallol Bera +3 more | 2023-11-21 |
| 11776793 | Plasma source with ceramic electrode plate | Robert B. Moore, Jared Ahmad Lee, Marc Shull, Alexander V. Garachtchenko, Dmitry A. Dzilno | 2023-10-03 |
| 11705312 | Vertically adjustable plasma source | Jared Ahmad Lee, Rakesh Ramadas, Dmitry A. Dzilno, Gregory J. Wilson, Sriharish Srinivasan | 2023-07-18 |
| 11699571 | Semiconductor processing chambers for deposition and etch | Khokan Chandra Paul, Ravikumar Patil, Vijet Patil, Carlaton WONG, Adam J. Fischbach +2 more | 2023-07-11 |
| D951867 | Servo amplifier | Hiroyuki Kato, Shinichi Kato, Asuna Osawa, Masaaki Kadoyanagi, Shotaro Hirako +1 more | 2022-05-17 |
| 11315763 | Shaped electrodes for improved plasma exposure from vertical plasma source | Kallol Bera, Dmitry A. Dzilno, Anantha K. Subramani, John C. Forster | 2022-04-26 |
| 11282676 | Paired dynamic parallel plate capacitively coupled plasmas | Hari Ponnekanti, Mandyam Sriram, Dmitry A. Dzilno, Sanjeev Baluja, Mario David Silvetti | 2022-03-22 |
| 11227735 | Gas circuit breaker | Toshiyuki Uchii, Tomoyuki Yoshino, Takato ISHII, Akira Shimamura | 2022-01-18 |
| 11222760 | Gas circuit breaker | Amane Majima, Tooru Inoue, Toshiyuki Uchii, Norimitsu Kato, Akira Shimamura +2 more | 2022-01-11 |
| 11217408 | Gas circuit breaker | Toshiyuki Uchii, Takanori IIJIMA, Tomoyuki Yoshino, Norimitsu Kato | 2022-01-04 |
| 11158489 | Methods and systems to modulate film stress | John C. Forster, Ran Liu, Kenichi Ohno, Ning Li, Mihaela Balseanu +2 more | 2021-10-26 |
| 11151431 | Printer and computer-readable medium storing computer-readable instructions | — | 2021-10-19 |
| 11081318 | Geometrically selective deposition of dielectric films utilizing low frequency bias | Kenichi Ohno, Keiichi Tanaka, Li-Qun Xia, Dmitry A. Dzilno, Mario David Silvetti +4 more | 2021-08-03 |
| 10860330 | Electronic apparatus having volatile memory including refresh circuit and method for backup-rebooting the electronic apparatus | — | 2020-12-08 |
| 10854428 | Spatial atomic layer deposition chamber with plasma pulsing to prevent charge damage | Dmitry A. Dzilno, Alexander V. Garachtchenko, Keiichi Tanaka | 2020-12-01 |