Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12417890 | Methods, systems, and apparatus for monitoring radiation output of lamps | Zhepeng CONG, Ashur J. ATANOS, Tao SHENG | 2025-09-16 |
| 12387956 | Systems and methods for controlling non-uniformity | Gautam K. Hemani | 2025-08-12 |
| 12205845 | Semiconductor processing chamber to accommodate parasitic plasma formation | Tsutomu Tanaka, Adam J. Fischbach, Abhijit A. Kangude, Juan Carlos Rocha-Alvarez | 2025-01-21 |
| 12142459 | Single chamber flowable film formation and treatments | Adam J. Fischbach, Tsutomu Tanaka, Canfeng Lai | 2024-11-12 |
| 12131903 | Pulsed-plasma deposition of thin film layers | — | 2024-10-29 |
| 12074042 | High-density substrate processing systems and methods | Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan Nguyen, Swaminathan Srinivasan | 2024-08-27 |
| 11887811 | Semiconductor processing chambers for deposition and etch | Ravikumar Patil | 2024-01-30 |
| 11699571 | Semiconductor processing chambers for deposition and etch | Ravikumar Patil, Vijet Patil, Carlaton WONG, Adam J. Fischbach, Timothy Franklin +2 more | 2023-07-11 |
| 11574826 | High-density substrate processing systems and methods | Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan Nguyen, Swaminathan Srinivasan | 2023-02-07 |
| 10527407 | In-situ metrology method for thickness measurement during PECVD processes | Edward W. Budiarto, Todd Egan, Mehdi Vaez-Iravani, Jeongmin Lee, Dale R. Du Bois +1 more | 2020-01-07 |
| 10388549 | On-board metrology (OBM) design and implication in process tool | Jay D. Pinson, II, Juan Carlos Rocha-Alvarez, Hari Ponnekanti, Rupankar Choudhury, Shekhar ATHANI +2 more | 2019-08-20 |
| 10373823 | Deployment of light energy within specific spectral bands in specific sequences for deposition, treatment and removal of materials | Swaminathan Srinivasan, Atashi Basu, Pramit Manna, Diwakar Kedlaya | 2019-08-06 |
| 10281261 | In-situ metrology method for thickness measurement during PECVD processes | Edward W. Budiarto, Todd Egan, Mehdi Vaez-Iravani, Jeongmin Lee, Dale R. Du Bois +1 more | 2019-05-07 |