| 11887847 |
Methods and precursors for selective deposition of metal films |
Kurt Fredrickson, Mihaela Balseanu, Ning Li |
2024-01-30 |
$39,141,000 |
| 11836429 |
Determination of recipes for manufacturing semiconductor devices |
Kapil Sawlani, David M. Fried, Michal Danek, Emily Ann Alden |
2023-12-05 |
$84,518,000 |
| 11621160 |
Doped and undoped vanadium oxides for low-k spacer applications |
Eswaranand Venkatasubramanian, Srinivas Gandikota, Kelvin Chan, Abhijit Basu Mallick |
2023-04-04 |
$41,324,000 |
| 11515151 |
Methods and precursors for selective deposition of metal films |
Kurt Fredrickson, Mihaela Balseanu, Ning Li |
2022-11-29 |
$23,914,000 |
| 11332488 |
Metal precursors with modified diazabutadiene ligands for CVD and ALD and methods of use |
Jeffrey W. Anthis, David Thompson, Nasrin Kazem |
2022-05-17 |
$39,228,000 |
| 11094533 |
Doped and undoped vanadium oxides for low-k spacer applications |
Eswaranand Venkatasubramanian, Srinivas Gandikota, Kelvin Chan, Abhijit Basu Mallick |
2021-08-17 |
$63,158,000 |
| 11078224 |
Precursors for the atomic layer deposition of transition metals and methods of use |
Jeffrey W. Anthis |
2021-08-03 |
$89,613,000 |
| 11049722 |
Methods and materials for modifying the threshold voltage of metal oxide stacks |
Siddarth A. Krishnan, Rajesh Sathiyanarayanan, Paul F. Ma |
2021-06-29 |
$47,858,000 |
| 10977405 |
Fill process optimization using feature scale modeling |
Michael J. Bowes, Kapil Sawlani, Dongyao Li, Anand Chandrashekar, David M. Fried +1 more |
2021-04-13 |
$221,486,000 |
| 10811250 |
Silicon nitride films with high nitrogen content |
Srinivas D. Nemani, Ellie Yieh |
2020-10-20 |
$40,793,000 |
| 10752649 |
Metal precursors with modified diazabutadiene ligands for CVD and ALD and methods of use |
Jeffrey W. Anthis, David Thompson, Nasrin Kazem |
2020-08-25 |
$29,525,000 |
| 10699952 |
Deposition and treatment of films for patterning |
Abhijit Basu Mallick, Ziqing Duan, Srinivas Gandikota |
2020-06-30 |
$26,020,000 |
| 10615041 |
Methods and materials for modifying the threshold voltage of metal oxide stacks |
Siddarth A. Krishnan, Rajesh Sathiyanarayanan, Paul F. Ma |
2020-04-07 |
$24,481,000 |
| 10608097 |
Low thickness dependent work-function nMOS integration for metal gate |
Paul F. Ma, Seshadri Ganguli, Shih Chung Chen, Rajesh Sathiyanarayanan, Lin Dong +3 more |
2020-03-31 |
$21,055,000 |
| 10510546 |
Schemes for selective deposition for patterning applications |
Abhijit Basu Mallick |
2019-12-17 |
$25,541,000 |
| 10475642 |
Doped and undoped vanadium oxides for low-k spacer applications |
Eswaranand Venkatasubramanian, Srinivas Gandikota, Kelvin Chan, Abhijit Basu Mallick |
2019-11-12 |
$41,829,000 |
| 10373823 |
Deployment of light energy within specific spectral bands in specific sequences for deposition, treatment and removal of materials |
Swaminathan Srinivasan, Pramit Manna, Khokan Chandra Paul, Diwakar Kedlaya |
2019-08-06 |
$24,698,000 |
| 10347495 |
Schemes for selective deposition for patterning applications |
Abhijit Basu Mallick |
2019-07-09 |
$20,979,000 |
| 10319636 |
Deposition and treatment of films for patterning |
Abhijit Basu Mallick, Ziqing Duan, Srinivas Gandikota |
2019-06-11 |
$20,889,000 |
| 10170321 |
Aluminum content control of TiAIN films |
Wenyu Zhang, Wei V. Tang, Yixiong Yang, CHEN-HAN LIN, Yi Xu +8 more |
2019-01-01 |
|
