Issued Patents All Time
Showing 1–25 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12351903 | Method and system for depositing molybdenum layers | Roghayyeh Lotfi, Jaebeom Lee, Eric Christopher Stevens, Amit Mishra | 2025-07-08 |
| 12241158 | Method for forming structures including transition metal layers | Roghayyeh Lotfi, Jaebeom Lee, Eric Christopher Stevens, Charith Nanayakkara | 2025-03-04 |
| 12237171 | Method of forming vanadium nitride layer and structure including the vanadium nitride layer | Giuseppe Alessio Verni, Qi Xie, Henri Jussila, Charles Dezelah, Jiyeon Kim +1 more | 2025-02-25 |
| 12006572 | Reactor system including a gas distribution assembly for use with activated species and method of using same | Xing Lin, Peipei Gao, Prajwal Nagaraj, Mingyang Ma, Wentao Wang +3 more | 2024-06-11 |
| 11901175 | Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer | Eric James Shero, Bed Prasad Sharma, Shankar Swaminathan | 2024-02-13 |
| 11885013 | Method of forming vanadium nitride layer and structure including the vanadium nitride layer | Giuseppe Alessio Verni, Qi Xie, Henri Jussila, Charles Dezelah, Jiyeon Kim +1 more | 2024-01-30 |
| 11791153 | Deposition of hafnium oxide within a high aspect ratio hole | Jiyeon Kim, Petri Raisanen, Sol Kim, Ying-Shen Kuo, Michael Schmotzer +1 more | 2023-10-17 |
| 11735420 | Wafer treatment for achieving defect-free self-assembled monolayers | Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo +5 more | 2023-08-22 |
| 11674220 | Method for depositing molybdenum layers using an underlayer | Roghayyeh Lotfi, Jaebeom Lee, Eric Christopher Stevens, Amit Mishra | 2023-06-13 |
| 11587829 | Doping control of metal nitride films | Annamalai Lakshmanan, Ben-Li Sheu, Guodan Wei, Nicole Lundy | 2023-02-21 |
| 11515155 | Methods for enhancing selectivity in SAM-based selective deposition | Chang Ke, Michael S. Jackson, Liqi Wu, Lei Zhou, Shuyi Zhang +3 more | 2022-11-29 |
| 11424119 | Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer | Eric James Shero, Bed Prasad Sharma, Shankar Swaminathan | 2022-08-23 |
| 11421318 | Methods and apparatus for high reflectivity aluminum layers | Jacqueline S. Wrench, Liqi Wu, Hsiang-Ning Wu, Sang Ho Yu, Fuqun Grace Vasiknanonte +1 more | 2022-08-23 |
| RE48994 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Faruk Gungor, David Chu, Chien-Teh Kao +2 more | 2022-03-29 |
| 11133155 | Apparatus for depositing metal films with plasma treatment | Daping Yao, Hyman Lam, John C. Forster, Jiang Lu, Can Xu +2 more | 2021-09-28 |
| 11049722 | Methods and materials for modifying the threshold voltage of metal oxide stacks | Siddarth A. Krishnan, Rajesh Sathiyanarayanan, Atashi Basu | 2021-06-29 |
| 11033930 | Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition | Chang Ke, Song-Moon Suh, Liqi Wu, Michael S. Jackson, Lei Zhou +3 more | 2021-06-15 |
| 11018009 | Tuning work function of p-metal work function films through vapor deposition | Guoqiang Jian, Wei V. Tang, Chi-Chou Lin, Yixiong Yang, Mei Chang +1 more | 2021-05-25 |
| 10982326 | Counter-flow multi inject for atomic layer deposition chamber | Dien-Yeh Wu, Guodan Wei, Chun-Teh Kao | 2021-04-20 |
| 10950433 | Methods for enhancing selectivity in SAM-based selective deposition | Chang Ke, Michael S. Jackson, Liqi Wu, Lei Zhou, Shuyi Zhang +3 more | 2021-03-16 |
| 10930472 | Methods for forming a metal silicide interconnection nanowire structure | Bencherki Mebarki, Annamalai Lakshmanan, Kaushal K. Singh, Andrew Cockburn, Ludovic Godet +1 more | 2021-02-23 |
| 10910263 | Doping control of metal nitride films | Annamalai Lakshmanan, Ben-Li Sheu, Guodan Wei, Nicole Lundy | 2021-02-02 |
| 10879081 | Methods of reducing or eliminating defects in tungsten film | Guoqiang Jian, Wei V. Tang, Chi-Chou Lin, Kai Wu, Vikash Banthia +4 more | 2020-12-29 |
| 10784157 | Doped tantalum nitride for copper barrier applications | Annamalai Lakshmanan, Mei Chang, Jennifer Shan | 2020-09-22 |
| 10770292 | Wafer treatment for achieving defect-free self-assembled monolayers | Chang Ke, Lei Zhou, Biao Liu, Cheng Pan, Yuanhong Guo +5 more | 2020-09-08 |