Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11598003 | Substrate processing chamber having heated showerhead assembly | Dien-Yeh Wu, Joel M. Huston, Mei Chang, Xiaoxiong Yuan, Kazuya Daito +4 more | 2023-03-07 |
| 11380557 | Apparatus and method for gas delivery in semiconductor process chambers | Vincent Kirchhoff, Felix Rabinovich, Gary Urban Keppers | 2022-07-05 |
| RE48994 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Paul F. Ma, David Chu, Chien-Teh Kao +2 more | 2022-03-29 |
| 10770300 | Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity | Takashi Kuratomi, Avgerinos V. Gelatos, I-Cheng Chen | 2020-09-08 |
| 10418246 | Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity | Takashi Kuratomi, Avgerinos V. Gelatos, I-Cheng Chen | 2019-09-17 |
| 10407771 | Atomic layer deposition chamber with thermal lid | Anqing Cui, Dien-Yeh Wu, Vikas Jangra, Muhammad M. Rasheed, Wei V. Tang +6 more | 2019-09-10 |
| RE47440 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Paul F. Ma, David Chu, Chien-Teh Kao +2 more | 2019-06-18 |
| 10175093 | Apparatus for sensing a level of a processing medium in a delivery apparatus | — | 2019-01-08 |
| 9683287 | Deposition of films comprising aluminum alloys with high aluminum content | David Thompson, Srinivas Gandikota, Xinliang Lu, Wei V. Tang, Jing Zhou +6 more | 2017-06-20 |
| 9145612 | Deposition of N-metal films comprising aluminum alloys | Srinivas Gandikota, Xinliang Lu, Shih Chung Chen, Wei V. Tang, Jing Zhou +8 more | 2015-09-29 |
| 9109754 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Paul F. Ma, David Chu, Chien-Teh Kao +2 more | 2015-08-18 |
| 8955547 | Apparatus and method for providing uniform flow of gas | Dien-Yeh Wu, Joseph Yudovsky, Mei Chang | 2015-02-17 |