Issued Patents All Time
Showing 25 most recent of 175 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11946135 | Low temperature deposition of iridium containing films | Feng Q. Liu, Hua Chung, Schubert S. Chu, Jeffrey W. Anthis, David Thompson | 2024-04-02 |
| 11643721 | Low temperature deposition of iridium containing films | Feng Q. Liu, Hua Chung, Schubert S. Chu, Jeffrey W. Anthis, David Thompson | 2023-05-09 |
| 11628456 | Apparatus for increasing flux from an ampoule | Kenric Choi, Xiaoxiong Yuan, Daping Yao | 2023-04-18 |
| RE48994 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Faruk Gungor, Paul F. Ma, David Chu, Chien-Teh Kao +2 more | 2022-03-29 |
| 11059061 | Apparatus for increasing flux from an ampoule | Kenric Choi, Xiaoxiong Yuan, Daping Yao | 2021-07-13 |
| 10879090 | High temperature process chamber lid | Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao | 2020-12-29 |
| 10784157 | Doped tantalum nitride for copper barrier applications | Annamalai Lakshmanan, Paul F. Ma, Jennifer Shan | 2020-09-22 |
| 10752990 | Apparatus and methods to remove residual precursor inside gas lines post-deposition | Daping Yao, Kenric Choi, Xiaoxiong Yuan, Jiang Lu, Can Xu +1 more | 2020-08-25 |
| 10559578 | Deposition of cobalt films with high deposition rate | Jacqueline S. Wrench, Jing Zhou, Fuqun Grace Vasiknanonte, Jiang Lu, Paul F. Ma +3 more | 2020-02-11 |
| 10483116 | Methods of depositing metal films using metal oxyhalide precursors | Xinyu Fu, David Knapp, David Thompson, Jeffrey W. Anthis | 2019-11-19 |
| RE47440 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Faruk Gungor, Paul F. Ma, David Chu, Chien-Teh Kao +2 more | 2019-06-18 |
| 9831109 | High temperature process chamber lid | Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Chien-Teh Kao | 2017-11-28 |
| 9773663 | Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD | Jessica S. Kachian, Naomi Yoshida, Mary Edmonds, Andrew C. Kummel, Sang Wook Park +1 more | 2017-09-26 |
| 9765432 | Dual-direction chemical delivery system for ALD/CVD chambers | Zhenbin Ge, Chien-Teh Kao, Joel M. Huston | 2017-09-19 |
| 9683287 | Deposition of films comprising aluminum alloys with high aluminum content | David Thompson, Srinivas Gandikota, Xinliang Lu, Wei V. Tang, Jing Zhou +6 more | 2017-06-20 |
| 9441298 | Devices including metal-silicon contacts using indium arsenide films and apparatus and methods | Khaled Ahmed, Prabu Gopalraja, Atif Noori | 2016-09-13 |
| 9353440 | Dual-direction chemical delivery system for ALD/CVD chambers | Zhenbin Ge, Chien-Teh Kao, Joel M. Huston | 2016-05-31 |
| 9305805 | Methods for atomic layer etching | Joseph Yudovsky | 2016-04-05 |
| 9269584 | N-metal film deposition with initiation layer | Seshadri Ganguli, Xinliang Lu, Atif Noori, Maitreyee Mahajani, Shih Chung Chen | 2016-02-23 |
| 9252024 | Deposition chambers with UV treatment and methods of use | Hyman Lam, Nicholas R. Denny, Joseph AuBuchon | 2016-02-02 |
| 9230815 | Methods for depositing fluorine/carbon-free conformal tungsten | Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, David Thompson +1 more | 2016-01-05 |
| 9190320 | Devices including metal-silicon contacts using indium arsenide films and apparatus and methods | Khaled Ahmed, Prabu Gopalraja, Atif Noori | 2015-11-17 |
| 9145612 | Deposition of N-metal films comprising aluminum alloys | Srinivas Gandikota, Xinliang Lu, Shih Chung Chen, Wei V. Tang, Jing Zhou +8 more | 2015-09-29 |
| 9109754 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Faruk Gungor, Paul F. Ma, David Chu, Chien-Teh Kao +2 more | 2015-08-18 |
| 9111876 | Methods for atomic layer etching | Joseph Yudovsky | 2015-08-18 |