Issued Patents All Time
Showing 25 most recent of 145 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12297559 | Method and apparatus for low temperature selective epitaxy in a deep trench | Abhishek Dube, Xuebin Li, Flora Fong-Song CHANG | 2025-05-13 |
| 12026433 | Image interaction using sound signals | Yu Meng | 2024-07-02 |
| 11959167 | Selective cobalt deposition on copper surfaces | Sang Ho Yu, Kevin Moraes, Seshadri Ganguli, See-Eng Phan | 2024-04-16 |
| 11946135 | Low temperature deposition of iridium containing films | Feng Q. Liu, Schubert S. Chu, Mei Chang, Jeffrey W. Anthis, David Thompson | 2024-04-02 |
| 11791166 | Selective etch process using hydrofluoric acid and ozone gases | Qi Zhang, Haichun Yang, Ting Xie, Michael X. Yang | 2023-10-17 |
| 11791181 | Methods for the treatment of workpieces | Ting Xie, Haochen Li, Xinliang Lu, Shawming Ma, Haichun Yang +1 more | 2023-10-17 |
| 11649559 | Method of utilizing a degassing chamber to reduce arsenic outgassing following deposition of arsenic-containing material on a substrate | Xinyu BAO, Chun Yan, Schubert S. Chu | 2023-05-16 |
| 11643721 | Low temperature deposition of iridium containing films | Feng Q. Liu, Schubert S. Chu, Mei Chang, Jeffrey W. Anthis, David Thompson | 2023-05-09 |
| 11626269 | Chamber seasoning to improve etch uniformity by reducing chemistry | Qi Zhang, Xinliang Lu | 2023-04-11 |
| 11495456 | Ozone for selective hydrophilic surface treatment | Ting Xie, Xinliang Lu, Michael X. Yang | 2022-11-08 |
| 11495437 | Surface pretreatment process to improve quality of oxide films produced by remote plasma | Ting Xie, Xinliang Lu, Michael X. Yang | 2022-11-08 |
| 11462413 | Processing of workpieces using deposition process and etch process | Shanyu Wang, Chun Yan, Michael X. Yang, Tsai Wen Sung, Qi Zhang | 2022-10-04 |
| 11387111 | Processing of workpieces with reactive species generated using alkyl halide | Michael X. Yang, Xinliang Lu | 2022-07-12 |
| 11384429 | Selective cobalt deposition on copper surfaces | Sang Ho Yu, Kevin Moraes, Seshadri Ganguli, See-Eng Phan | 2022-07-12 |
| 11387115 | Silicon mandrel etch after native oxide punch-through | Chun Yan, Tsai Wen Sung, Sio On Lo, Michael X. Yang | 2022-07-12 |
| 11315801 | Processing of workpieces using ozone gas and hydrogen radicals | Qi Zhang, Haichun Yang, Michael X. Yang | 2022-04-26 |
| 11251050 | Silicon oxide selective dry etch process | Qi Zhang, Xinliang Lu, Haichun Yang | 2022-02-15 |
| 11195718 | Spacer open process by dual plasma | Tsai Wen Sung, Chun Yan, Michael X. Yang, Dixit V. Desai, Peter J. Lembesis | 2021-12-07 |
| 11183397 | Selective etch process using hydrofluoric acid and ozone gases | Qi Zhang, Haichun Yang, Ting Xie, Michael X. Yang | 2021-11-23 |
| 11164725 | Generation of hydrogen reactive species for processing of workpieces | Qi Zhang, Xinliang Lu, Michael X. Yang | 2021-11-02 |
| 11164727 | Processing of workpieces using hydrogen radicals and ozone gas | Ting Xie, Bin Dong, Xinliang Lu, Haichun Yang, Michael X. Yang | 2021-11-02 |
| 11164742 | Selective deposition using methylation treatment | Michael X. Yang, Xinliang Lu | 2021-11-02 |
| 11164767 | Integrated system for semiconductor process | Xinyu BAO, Schubert S. Chu | 2021-11-02 |
| 11124874 | Methods for depositing metallic iridium and iridium silicide | Feng Q. Liu, Schubert S. Chu | 2021-09-21 |
| 11107695 | Surface smoothing of workpieces | Qi Zhang, Xinliang Lu | 2021-08-31 |