Issued Patents All Time
Showing 1–25 of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12347677 | Enhanced ignition in inductively coupled plasmas for workpiece processing | Stephen E. Savas | 2025-07-01 |
| 12159789 | Atomic layer etch process using plasma in conjunction with a rapid thermal activation process | — | 2024-12-03 |
| 12119216 | Arc lamp with forming gas for thermal processing systems | Michael X. Yang, Rolf Bremensdorfer, Dave Camm, Joseph Cibere, Dieter Hezler +1 more | 2024-10-15 |
| 12002652 | Variable mode plasma chamber utilizing tunable plasma potential | Stephen E. Savas | 2024-06-04 |
| 11848204 | Enhanced ignition in inductively coupled plasmas for workpiece processing | Stephen E. Savas | 2023-12-19 |
| 11791181 | Methods for the treatment of workpieces | Ting Xie, Hua Chung, Haochen Li, Xinliang Lu, Haichun Yang +1 more | 2023-10-17 |
| 11764072 | Method for processing a workpiece using a multi-cycle thermal treatment process | Michael X. Yang | 2023-09-19 |
| 11721539 | Arc lamp with forming gas for thermal processing systems | Michael X. Yang, Rolf Bremensdorfer, Dave Camm, Joseph Cibere, Dieter Hezler +1 more | 2023-08-08 |
| 11508560 | Focus ring adjustment assembly of a system for processing workpieces under vacuum | Martin L. Zucker, Peter J. Lembesis, Ryan Pakulski | 2022-11-22 |
| 11348767 | Plasma processing apparatus having a focus ring adjustment assembly | Martin L. Zucker, Peter J. Lembesis, Ryan Pakulski | 2022-05-31 |
| 11348784 | Enhanced ignition in inductively coupled plasmas for workpiece processing | Stephen E. Savas | 2022-05-31 |
| 11289323 | Processing of semiconductors using vaporized solvents | Shuang Meng, Michael X. Yang | 2022-03-29 |
| 11264249 | Carbon containing hardmask removal process using sulfur containing process gas | Fen Dai, Tinghao Wang, Oliver Jan, Moo-Hyun Kim, Zhongming Liu | 2022-03-01 |
| 11201036 | Plasma strip tool with uniformity control | Vladimir Nagorny, Dixit V. Desai, Ryan Pakulski | 2021-12-14 |
| 11189464 | Variable mode plasma chamber utilizing tunable plasma potential | Stephen E. Savas | 2021-11-30 |
| 11062912 | Atomic layer etch process using plasma in conjunction with a rapid thermal activation process | — | 2021-07-13 |
| 11049692 | Methods for tuning plasma potential using variable mode plasma chamber | Stephen E. Savas | 2021-06-29 |
| 11039527 | Air leak detection in plasma processing apparatus with separation grid | Shuang Meng, Xinliang Lu, Hua Chung | 2021-06-15 |
| 10950428 | Method for processing a workpiece | Ting Xie, Hua Chung, Xinliang Lu, Michael X. Yang | 2021-03-16 |
| 10901321 | Strip process for high aspect ratio structure | Vijay M. Vaniapura, Li Hou | 2021-01-26 |
| 10790119 | Plasma processing apparatus with post plasma gas injection | Vladimir Nagorny, Dixit V. Desai, Ryan Pakulski | 2020-09-29 |
| 10599039 | Strip process for high aspect ratio structure | Vijay M. Vaniapura, Li Hou | 2020-03-24 |
| 10580661 | Atomic layer etch process using plasma in conjunction with a rapid thermal activation process | — | 2020-03-03 |
| 10573532 | Method for processing a workpiece using a multi-cycle thermal treatment process | Michael X. Yang | 2020-02-25 |
| 10078266 | Implanted photoresist stripping process | Wei-Hua Liou, Chun-Yen Kang, Vijay M. Vaniapura, Hai-Au M. Phan-Vu | 2018-09-18 |