Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12148608 | Post etch defluorination process | Andrei Gramada | 2024-11-19 |
| 11107693 | Method for high aspect ratio photoresist removal in pure reducing plasma | Li Diao, Robert George Elliston, David Gilbert, Chan-Yun Lee, James Paris +2 more | 2021-08-31 |
| 11094528 | Surface treatment of substrates using passivation layers | Tongchuan Gao, Grigoriy Kishko, Michael X. Yang | 2021-08-17 |
| 10901321 | Strip process for high aspect ratio structure | Shawming Ma, Li Hou | 2021-01-26 |
| 10872761 | Post etch defluorination process | Andrei Gramada | 2020-12-22 |
| 10599039 | Strip process for high aspect ratio structure | Shawming Ma, Li Hou | 2020-03-24 |
| 10431469 | Method for high aspect ratio photoresist removal in pure reducing plasma | Li Diao, Robert George Elliston, David Gilbert, Chan-Yun Lee, James Paris +2 more | 2019-10-01 |
| 10217626 | Surface treatment of substrates using passivation layers | Tongchuan Gao, Grigoriy Kishko, Michael X. Yang | 2019-02-26 |
| 10078266 | Implanted photoresist stripping process | Wei-Hua Liou, Chun-Yen Kang, Hai-Au M. Phan-Vu, Shawming Ma | 2018-09-18 |
| 9396963 | Mask removal process strategy for vertical NAND device | Li Diao, HaiAu PhanVu | 2016-07-19 |