Issued Patents All Time
Showing 25 most recent of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394620 | Benzyl compound passivation for selective deposition and selective etch protection | Feng Q. Liu, Mark Saly | 2025-08-19 |
| 12300491 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan +3 more | 2025-05-13 |
| 12291779 | Methods of selective atomic layer deposition | Bhaskar Jyoti Bhuyan, Mark Saly, Tobin Kaufman-Osborn, Kurt Fredrickson, Thomas Knisley +1 more | 2025-05-06 |
| 12281387 | Method of depositing metal films | Feng Q. Liu, Mark Saly, Annamalai Lakshmanan, Avgerinos V. Gelatos, Joung Joo Lee | 2025-04-22 |
| 12272551 | Selective metal removal with flowable polymer | Liqi Wu, Feng Q. Liu, Bhaskar Jyoti Bhuyan, James Hugh Connolly, Zhimin QI +7 more | 2025-04-08 |
| 12261049 | Selective etch of a substrate | Bhaskar Jyoti Bhuyan, Mark Saly, Lisa J. Enman, Aaron Dangerfield, Jesus Candelario Mendoza +2 more | 2025-03-25 |
| 12094766 | Selective blocking of metal surfaces using bifunctional self-assembled monolayers | Michael L. McSwiney, Bhaskar Jyoti Bhuyan, Mark Saly, Drew Phillips, Aaron Dangerfield +2 more | 2024-09-17 |
| 12084764 | Vapor phase photoresists deposition | Lakmal C. Kalutarage, Aaron Dangerfield, Mark Saly, Susmit Singha Roy, Regina Freed | 2024-09-10 |
| 11946135 | Low temperature deposition of iridium containing films | Feng Q. Liu, Hua Chung, Schubert S. Chu, Mei Chang, Jeffrey W. Anthis | 2024-04-02 |
| 11894233 | Electronic device having an oxygen free platinum group metal film | Yixiong Yang, Wei V. Tang, Seshadri Ganguli, Sang Ho Yu, Feng Q. Liu +3 more | 2024-02-06 |
| 11886120 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan +3 more | 2024-01-30 |
| 11848229 | Selective blocking of metal surfaces using bifunctional self-assembled monolayers | Michael L. McSwiney, Bhaskar Jyoti Bhuyan, Mark Saly, Drew Phillips, Aaron Dangerfield +2 more | 2023-12-19 |
| 11643721 | Low temperature deposition of iridium containing films | Feng Q. Liu, Hua Chung, Schubert S. Chu, Mei Chang, Jeffrey W. Anthis | 2023-05-09 |
| 11562904 | Deposition of semiconductor integration films | Lakmal C. Kalutarage, Mark Saly, Bhaskar Jyoti Bhuyan, Thomas Knisley, Kelvin Chan +3 more | 2023-01-24 |
| 11515149 | Deposition of flowable silicon-containing films | Lakmal C. Kalutarage, Mark Saly, Abhijit Basu Mallick, Tejasvi Ashok, Pramit Manna | 2022-11-29 |
| 11488830 | Oxygen free deposition of platinum group metal films | Yixiong Yang, Wei V. Tang, Seshadri Ganguli, Sang Ho Yu, Feng Q. Liu +3 more | 2022-11-01 |
| 11450525 | Selective aluminum oxide film deposition | Liqi Wu, Hung T. Nguyen, Bhaskar Jyoti Bhuyan, Mark Saly, Feng Q. Liu | 2022-09-20 |
| 11286564 | Tin-containing precursors and methods of depositing tin-containing films | Thomas Knisley, Mark Saly | 2022-03-29 |
| 11289328 | Deposition and etch processes of chromium-containing thin films for semiconductor manufacturing | Thomas Knisley, Mark Saly, Lakmal C. Kalutarage | 2022-03-29 |
| 11094544 | Methods of forming self-aligned vias | Benjamin Schmiege, Jeffrey W. Anthis, Abhijit Basu Mallick, Susmit Singha Roy, Ziqing Duan +3 more | 2021-08-17 |
| 11028480 | Methods of protecting metallic components against corrosion using chromium-containing thin films | Thomas Knisley, Mark Saly, David Alexander BRITZ | 2021-06-08 |
| 11028478 | Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors | Victor Nguyen, Ning Li, Mihaela Balseanu, Li-Qun Xia, Mark Saly | 2021-06-08 |
| 11028477 | Bottom-up gap-fill by surface poisoning treatment | Mark Saly, Keiichi Tanaka, Eswaranand Venkatasubramanian, Mandyam Sriram, Bhaskar Jyoti Bhuyan +2 more | 2021-06-08 |
| 10985009 | Methods to deposit flowable (gap-fill) carbon containing films using various plasma sources | Lakmal C. Kalutarage, Mark Saly, William J. Durand, Kelvin Chan, Hanhong Chen +1 more | 2021-04-20 |
| 10906925 | Ruthenium precursors for ALD and CVD thin film deposition and uses thereof | Benjamin Schmiege, Jeffrey W. Anthis | 2021-02-02 |