Issued Patents All Time
Showing 26–50 of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10804094 | Methods of depositing SiCON with C, O and N compositional control | Mark Saly, Thomas Knisley, Bhaskar Jyoti Bhuyan | 2020-10-13 |
| 10790188 | Seamless ruthenium gap fill | Nasrin Kazem, Jeffrey W. Anthis | 2020-09-29 |
| 10760159 | Methods and apparatus for depositing yttrium-containing films | Lakmal C. Kalutarage, Mark Saly, Thomas Knisley, Benjamin Schmiege | 2020-09-01 |
| 10752649 | Metal precursors with modified diazabutadiene ligands for CVD and ALD and methods of use | Jeffrey W. Anthis, Atashi Basu, Nasrin Kazem | 2020-08-25 |
| 10738008 | Nitrogen-containing ligands and their use in atomic layer deposition methods | Jeffrey W. Anthis | 2020-08-11 |
| 10699897 | Acetylide-based silicon precursors and their use as ALD/CVD precursors | Mark Saly, Bhaskar Jyoti Bhuyan, Jeffrey W. Anthis, Feng Q. Liu | 2020-06-30 |
| 10643838 | In-situ formation of non-volatile lanthanide thin film precursors and use in ALD and CVD | Benjamin Schmiege, Jeffrey W. Anthis | 2020-05-05 |
| 10577386 | Ruthenium precursors for ALD and CVD thin film deposition and uses thereof | Benjamin Schmiege, Jeffrey W. Anthis | 2020-03-03 |
| 10483116 | Methods of depositing metal films using metal oxyhalide precursors | Xinyu Fu, David Knapp, Jeffrey W. Anthis, Mei Chang | 2019-11-19 |
| 10410865 | Methods of forming self-aligned vias | Benjamin Schmiege, Jeffrey W. Anthis, Abhijit Basu Mallick, Susmit Singha Roy, Ziqing Duan +3 more | 2019-09-10 |
| 10366878 | Selective deposition through formation of self-assembled monolayers | Jessica S. Kachian, Tobin Kaufman-Osborn | 2019-07-30 |
| 10354861 | Low temperature molecular layer deposition of SiCON | Mark Saly, Lakmal C. Kalutarage | 2019-07-16 |
| 10323054 | Precursors for deposition of metal, metal nitride and metal oxide based films of transition metals | Benjamin Schmiege, Jeffrey W. Anthis | 2019-06-18 |
| 10315995 | Nitrogen-containing ligands and their use in atomic layer deposition methods | Jeffrey W. Anthis | 2019-06-11 |
| 10283352 | Precursors of manganese and manganese-based compounds for copper diffusion barrier layers and methods of use | Feng Q. Liu, Ben-Li Sheu, David Knapp | 2019-05-07 |
| 10242885 | Selective dry etching of metal films comprising multiple metal oxides | Jeffrey W. Anthis, Benjamin Schmiege | 2019-03-26 |
| 10233541 | Deposition of films containing alkaline earth metals | — | 2019-03-19 |
| 10219373 | Selective deposition of thin film dielectrics using surface blocking chemistry | Mark Saly, Bhaskar Jyoti Bhuyan | 2019-02-26 |
| 10170321 | Aluminum content control of TiAIN films | Wenyu Zhang, Wei V. Tang, Yixiong Yang, CHEN-HAN LIN, Yi Xu +8 more | 2019-01-01 |
| 10115593 | Chemical modification of hardmask films for enhanced etching and selective removal | David Knapp, Simon Huang, Jeffrey W. Anthis, Philip Alan Kraus | 2018-10-30 |
| 10083834 | Methods of forming self-aligned vias | Benjamin Schmiege, Jeffrey W. Anthis, Abhijit Basu Mallick, Susmit Singha Roy, Ziqing Duan | 2018-09-25 |
| 10023958 | Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors | Victor Nguyen, Ning Li, Mihaela Balseanu, Li-Qun Xia, Mark Saly | 2018-07-17 |
| 9875889 | Atomic layer deposition of films comprising Si(C)N using hydrazine, azide and/or silyl amine derivatives | — | 2018-01-23 |
| 9870915 | Chemical modification of hardmask films for enhanced etching and selective removal | David Knapp, Simon Huang, Jeffrey W. Anthis, Philip Alan Kraus | 2018-01-16 |
| 9812318 | Low temperature molecular layer deposition of SiCON | Mark Saly, Lakmal C. Kalutarage | 2017-11-07 |