DK

David Knapp

Applied Materials: 16 patents #838 of 7,310Top 15%
UI University Of Illinois: 12 patents #63 of 3,009Top 3%
NY Nystrom: 5 patents #1 of 8Top 15%
Boston Scientific Scimed: 4 patents #1,064 of 3,579Top 30%
SS Scimed Life Systems: 1 patents #685 of 1,161Top 60%
Overall (All Time): #81,177 of 4,157,543Top 2%
39
Patents All Time

Issued Patents All Time

Showing 25 most recent of 39 patents

Patent #TitleCo-InventorsDate
12315733 Enhanced etch selectivity using halides Feng Qiao, Hailong Zhou, Junkai He, Qian Fu, Mark Saly +2 more 2025-05-27
12272531 Dual pressure oxidation method for forming an oxide layer in a feature Christopher S. Olsen, Rene George, Tsung-Han Yang, Lara Hawrylchak 2025-04-08
11970512 Amphotericin B derivatives with improved therapeutic index Martin D. Burke, Stephen Thomas Davis, Brice E. Uno, Justin Struble, Ian Dailey +3 more 2024-04-30
11933942 Non-line-of-sight deposition of coating on internal components of assembled device Alexander Berger, Cheng-Hsuan Chou 2024-03-19
11117920 Amphotericin B derivatives with improved therapeutic index Martin D. Burke, Stephen Thomas Davis, Brice E. Uno, Justin Struble, Ian Dailey +3 more 2021-09-14
11028114 Amphotericin B derivatives with improved therapeutic index Martin D. Burke, Stephen Thomas Davis, Brice E. Uno, Justin Struble, Ian Dailey +3 more 2021-06-08
10483116 Methods of depositing metal films using metal oxyhalide precursors Xinyu Fu, David Thompson, Jeffrey W. Anthis, Mei Chang 2019-11-19
10323057 Amphotericin B derivatives with improved therapeutic index Martin D. Burke, Stephen Thomas Davis, Brice E. Uno, Justin Struble, Ian Dailey +3 more 2019-06-18
10283352 Precursors of manganese and manganese-based compounds for copper diffusion barrier layers and methods of use Feng Q. Liu, Ben-Li Sheu, David Thompson 2019-05-07
10121671 Methods of depositing metal films using metal oxyhalide precursors Xinyu Fu, David Thompson, Jeffrey W. Anthis, Mei Chang 2018-11-06
10115593 Chemical modification of hardmask films for enhanced etching and selective removal Simon Huang, Jeffrey W. Anthis, Philip Alan Kraus, David Thompson 2018-10-30
9982345 Deposition of metal films using beta-hydrogen free precursors David Thompson, Jeffrey W. Anthis 2018-05-29
9922872 Tungsten films by organometallic or silane pre-treatment of substrate Jeffrey W. Anthis, Xinyu Fu, Srinivas Gandikota 2018-03-20
9916975 Precursors of manganese and manganese-based compounds for copper diffusion barrier layers and methods of use Feng Q. Liu, Ben-Li Sheu, David Thompson 2018-03-13
9908900 Methods for forming protected organoboronic acids Martin D. Burke, Graham R. Dick, Eric P. Gillis, Jenna A. Klubnick 2018-03-06
9870915 Chemical modification of hardmask films for enhanced etching and selective removal Simon Huang, Jeffrey W. Anthis, Philip Alan Kraus, David Thompson 2018-01-16
9845317 Slow release of organoboronic acids in cross-coupling reactions Martin D. Burke, Eric P. Gillis 2017-12-19
9449843 Selectively etching metals and metal nitrides conformally Mikhail Korolik, Nitin K. Ingle, David Thompson, Jeffrey W. Anthis, Benjamin Schmiege 2016-09-20
9353131 Methods for forming protected organoboronic acids Martin D. Burke, Graham R. Dick, Eric P. Gillis, Jenna A. Klubnick 2016-05-31
9328102 Slow release of organoboronic acids in cross-coupling reactions Martin D. Burke, Eric P. Gillis 2016-05-03
9194040 Methods for producing nickel-containing films 2015-11-24
9196474 Metal amide deposition precursors and their stabilization with an inert ampoule liner David Thompson 2015-11-24
9006463 Slow release of organoboronic acids in cross-coupling reactions Martin D. Burke, Eric P. Gillis 2015-04-14
9005704 Methods for depositing films comprising cobalt and cobalt nitrides David Thompson, Jeffrey W. Anthis, Benjamin Schmiege 2015-04-14
8859045 Method for producing nickel-containing films David Thompson 2014-10-14