Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12272531 | Dual pressure oxidation method for forming an oxide layer in a feature | Christopher S. Olsen, Tsung-Han Yang, David Knapp, Lara Hawrylchak | 2025-04-08 |
| 12272521 | Plasma sources and plasma processing apparatus thereof | Vladimir Nagorny, Wei Liu | 2025-04-08 |
| 12211677 | Uniformity control for plasma processing | Vladimir Nagorny | 2025-01-28 |
| 12139790 | Processing system and method of delivering a reactant gas | Vishwas Kumar Pandey, Christopher S. Olsen, Eric Kihara Shono, Lara Hawrylchak, Erika HANSEN +3 more | 2024-11-12 |
| 11959169 | Asymmetric injection for better wafer uniformity | Eric Kihara Shono, Vishwas Kumar Pandey, Christopher S. Olsen, Kartik Shah, Hansel LO +3 more | 2024-04-16 |
| 11885021 | Gas supply member with baffle | Kartik Shah, Vishwas Kumar Pandey, Kailash Pradhan, Sairaju Tallavarjula, Eric Kihara Shono +2 more | 2024-01-30 |
| 11854770 | Plasma processing with independent temperature control | Wei Liu, Vladimir Nagorny | 2023-12-26 |
| 11658006 | Plasma sources and plasma processing apparatus thereof | Vladimir Nagorny, Wei Liu | 2023-05-23 |
| 11529592 | Gas injector with baffle | Vishwas Kumar Pandey, Lara Hawrylchak, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen +4 more | 2022-12-20 |
| 11486038 | Asymmetric injection for better wafer uniformity | Eric Kihara Shono, Vishwas Kumar Pandey, Christopher S. Olsen, Kartik Shah, Hansel LO +3 more | 2022-11-01 |
| 11124878 | Gas supply member with baffle | Kartik Shah, Vishwas Kumar Pandey, Kailash Pradhan, Sairaju Tallavarjula, Eric Kihara Shono +2 more | 2021-09-21 |
| 11077410 | Gas injector with baffle | Vishwas Kumar Pandey, Lara Hawrylchak, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen +4 more | 2021-08-03 |
| 10971357 | Thin film treatment process | Wei Liu, Theresa Kramer Guarini, Linlin Wang, Malcolm J. Bevan, Johanes S. Swenberg +4 more | 2021-04-06 |
| 10504779 | Hydrogenation and nitridization processes for reducing oxygen content in a film | Johanes S. Swenberg, Wei Liu, Houda Graoui, Shashank Sharma, Shankar Muthukrishnan | 2019-12-10 |
| 10290504 | Plasma treating a process chamber | Wei Liu, Theresa Kramer Guarini, Huy Q. Nguyen, Malcolm J. Bevan, Houda Graoui +3 more | 2019-05-14 |
| 10236207 | Hydrogenation and nitridization processes for reducing oxygen content in a film | Johanes S. Swenberg, Wei Liu, Houda Graoui, Shashank Sharma, Shankar Muthukrishnan | 2019-03-19 |
| 9831091 | Plasma treating a process chamber | Wei Liu, Theresa Kramer Guarini, Huy Q. Nguyen, Malcolm J. Bevan, Houda Graoui +3 more | 2017-11-28 |
| 9184072 | Advanced multi-workpiece processing chamber | Daniel J. Devine, Charles Crapuchettes, Dixit V. Desai, Vincent Lee, Yuya Matsuda +4 more | 2015-11-10 |
| 8413604 | Slotted electrostatic shield modification for improved etch and CVD process uniformity | Andreas Kadavanich, Daniel J. Devine, Stephen E. Savas, John Zajac, Hongching Shan | 2013-04-09 |
| 8066815 | Multi-workpiece processing chamber | Daniel J. Devine, Ce Qin, Dixit V. Desai | 2011-11-29 |
| 7947605 | Post ion implant photoresist strip using a pattern fill and method | Stephen E. Savas | 2011-05-24 |
| 7799685 | System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing | Stephen E. Savas, Songlin Xu, David Dutton, Andreas Kadavanich | 2010-09-21 |
| 7276122 | Multi-workpiece processing chamber | Daniel J. Devine, Ce Qin, Dixit V. Desai | 2007-10-02 |
| 7232767 | Slotted electrostatic shield modification for improved etch and CVD process uniformity | Andreas Kadavanich, Daniel J. Devine, Stephen E. Savas, John Zajac, Hongching Shan | 2007-06-19 |
| 6624082 | Systems and methods for two-sided etch of a semiconductor substrate | Laizhong Luo, Ying Holden, Robert Guerra, Allan B. Wiesnoski, Nicole Kuhl +2 more | 2003-09-23 |