Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12354843 | Process chamber process kit with protective coating | Jian-Lin Wu, Wei Liu, Linlin Wang, Malcolm J. Bevan, Lara Hawrylchak | 2025-07-08 |
| 12266560 | Film thickness uniformity improvement using edge ring and bias electrode geometry | Kin Pong Lo, Vladimir Nagorny, Wei Liu, Bernard L. Hwang, Malcolm J. Bevan +2 more | 2025-04-01 |
| D1034491 | Edge ring | Kin Pong Lo, Vladimir Nagorny, Wei Liu, Bernard L. Hwang, Malcolm J. Bevan +2 more | 2024-07-09 |
| 11927482 | Methods for calibrating an optical emission spectrometer | Kin Pong Lo, Lara Hawrylchak, Malcolm J. Bevan, Wei Liu, Bernard L. Hwang | 2024-03-12 |
| 11923441 | Gate all around I/O engineering | Steven C. H. Hung, Benjamin Colombeau, Andy Lo, Byeong-Chan Lee, Johanes F. Swenberg +1 more | 2024-03-05 |
| 11450759 | Gate all around I/O engineering | Steven C. H. Hung, Benjamin Colombeau, Andy Lo, Byeong-Chan Lee, Johanes F. Swenberg +1 more | 2022-09-20 |
| 11380575 | Film thickness uniformity improvement using edge ring and bias electrode geometry | Kin Pong Lo, Vladimir Nagorny, Wei Liu, Bernard L. Hwang, Malcolm J. Bevan +2 more | 2022-07-05 |
| 11145761 | Horizontal gate all around and FinFET device isolation | Shiyu Sun, Naomi Yoshida, Sung Won Jun, Vanessa Pena, Errol Antonio C. Sanchez +4 more | 2021-10-12 |
| 10971357 | Thin film treatment process | Wei Liu, Linlin Wang, Malcolm J. Bevan, Johanes S. Swenberg, Vladimir Nagorny +4 more | 2021-04-06 |
| 10837122 | Method and apparatus for precleaning a substrate surface prior to epitaxial growth | Christopher S. Olsen, Jeffrey Tobin, Lara Hawrylchak, Peter Stone, Chi-Wei Lo +1 more | 2020-11-17 |
| 10573719 | Horizontal gate all around device isolation | Shiyu Sun, Naomi Yoshida, Sung Won Jun, Benjamin Colombeau, Michael Chudzik | 2020-02-25 |
| 10490666 | Horizontal gate all around and FinFET device isolation | Shiyu Sun, Nam Sung Kim, Naomi Yoshida, Sung Won Jun, Vanessa Pena +4 more | 2019-11-26 |
| 10428441 | Method and apparatus for precleaning a substrate surface prior to epitaxial growth | Christopher S. Olsen, Jeffrey Tobin, Lara Hawrylchak, Peter Stone, Chi-Wei Lo +1 more | 2019-10-01 |
| 10290504 | Plasma treating a process chamber | Wei Liu, Huy Q. Nguyen, Malcolm J. Bevan, Houda Graoui, Philip A. Bottini +3 more | 2019-05-14 |
| 9865735 | Horizontal gate all around and FinFET device isolation | Shiyu Sun, Naomi Yoshida, Sung Won Jun, Vanessa Pena, Errol Antonio C. Sanchez +4 more | 2018-01-09 |
| 9831091 | Plasma treating a process chamber | Wei Liu, Huy Q. Nguyen, Malcolm J. Bevan, Houda Graoui, Philip A. Bottini +3 more | 2017-11-28 |
| 9683308 | Method and apparatus for precleaning a substrate surface prior to epitaxial growth | Christopher S. Olsen, Jeffrey Tobin, Lara Hawrylchak, Peter Stone, Chi-Wei Lo +1 more | 2017-06-20 |
| 9460920 | Horizontal gate all around device isolation | Shiyu Sun, Naomi Yoshida, Sung Won Jun, Benjamin Colombeau, Michael Chudzik | 2016-10-04 |
| 9177787 | NH3 containing plasma nitridation of a layer of a three dimensional structure on a substrate | Wei Liu | 2015-11-03 |
| 9023700 | Method and apparatus for single step selective nitridation | Udayan Ganguly, Matthew S. Rogers, Yoshitaka Yokota, Johanes S. Swenberg, Malcolm J. Bevan | 2015-05-05 |
| 8748259 | Method and apparatus for single step selective nitridation | Udayan Ganguly, Matthew S. Rogers, Yoshitaka Yokota, Johanes S. Swenberg, Malcolm J. Bevan | 2014-06-10 |
| 8163626 | Enhancing NAND flash floating gate performance | Johanes Swenburg, David Chu, Yonah Cho, Udayan Ganguly, Lucien Date | 2012-04-24 |
| 8144329 | Low power RF tuning using optical and non-reflected power methods | James P. Cruse, Jeffrey Charles Pierce | 2012-03-27 |
| 7972933 | Method of selective nitridation | Christopher S. Olsen, Johanes S. Swenberg, Udayan Ganguly, Yonah Cho | 2011-07-05 |