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Methods for calibrating an optical emission spectrometer |
Kin Pong Lo, Lara Hawrylchak, Theresa Kramer Guarini, Wenjia Liu, Bernard L. Hwang |
2025-12-02 |
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Process chamber process kit with protective coating |
Jian-Lin Wu, Wei Liu, Theresa Kramer Guarini, Linlin Wang, Lara Hawrylchak |
2025-07-08 |
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Film thickness uniformity improvement using edge ring and bias electrode geometry |
Kin Pong Lo, Vladimir Nagorny, Wei Liu, Theresa Kramer Guarini, Bernard L. Hwang +2 more |
2025-04-01 |
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Edge ring |
Kin Pong Lo, Vladimir Nagorny, Wei Liu, Theresa Kramer Guarini, Bernard L. Hwang +2 more |
2024-07-09 |
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Methods for calibrating an optical emission spectrometer |
Kin Pong Lo, Lara Hawrylchak, Theresa Kramer Guarini, Wei Liu, Bernard L. Hwang |
2024-03-12 |
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Gate all around I/O engineering |
Steven C. H. Hung, Benjamin Colombeau, Andy Lo, Byeong-Chan Lee, Johanes F. Swenberg +1 more |
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Method and apparatus for selective nitridation process |
Matthew S. Rogers, Roger Curtis, Lara Hawrylchak, Canfeng Lai, Bernard L. Hwang +2 more |
2023-02-14 |
$35,617,000 |
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Gate interface engineering with doped layer |
Steven C. H. Hung, Benjamin Colombeau, Abhishek Dube, Sheng-Chin Kung, Patricia M. Liu +1 more |
2022-09-27 |
$38,581,000 |
| 11450759 |
Gate all around I/O engineering |
Steven C. H. Hung, Benjamin Colombeau, Andy Lo, Byeong-Chan Lee, Johanes F. Swenberg +1 more |
2022-09-20 |
$25,949,000 |
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Film thickness uniformity improvement using edge ring and bias electrode geometry |
Kin Pong Lo, Vladimir Nagorny, Wei Liu, Theresa Kramer Guarini, Bernard L. Hwang +2 more |
2022-07-05 |
$35,888,000 |
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Cap oxidation for FinFET formation |
Steven C. H. Hung, Benjamin Colombeau, Abhishek Dube, Sheng-Chin Kung, Patricia M. Liu +1 more |
2022-03-08 |
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Thin film treatment process |
Wei Liu, Theresa Kramer Guarini, Linlin Wang, Johanes S. Swenberg, Vladimir Nagorny +4 more |
2021-04-06 |
$63,491,000 |
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Method and apparatus for selective nitridation process |
Matthew S. Rogers, Roger Curtis, Lara Hawrylchak, Canfeng Lai, Bernard L. Hwang +2 more |
2021-03-16 |
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Treatments to enhance material structures |
David Chu, Steven C. H. Hung, Charles Chu, Tatsuya Sato, Shih Chung Chen +2 more |
2020-12-22 |
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Plasma treating a process chamber |
Wei Liu, Theresa Kramer Guarini, Huy Q. Nguyen, Houda Graoui, Philip A. Bottini +3 more |
2019-05-14 |
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System and method for mitigating oxide growth in a gate dielectric |
Haowen Bu, Hiroaki Niimi, Husam N. Alshareef |
2018-09-04 |
$18,628,000 |
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Method and apparatus for selective nitridation process |
Matthew S. Rogers, Roger Curtis, Lara Hawrylchak, Ken Kaung Lai, Bernard L. Hwang +2 more |
2018-08-14 |
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System and method for mitigating oxide growth in a gate dielectric |
Haowen Bu, Hiroaki Niimi, Husam N. Alshareef |
2018-02-13 |
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Plasma treating a process chamber |
Wei Liu, Theresa Kramer Guarini, Huy Q. Nguyen, Houda Graoui, Philip A. Bottini +3 more |
2017-11-28 |
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System and method for mitigating oxide growth in a gate dielectric |
Haowen Bu, Hiroaki Niimi, Husam N. Alshareef |
2017-10-03 |
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System and method for mitigating oxide growth in a gate dielectric |
Haowen Bu, Hiroaki Niimi, Husam N. Alshareef |
2017-02-21 |
$11,965,000 |
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System and method for mitigating oxide growth in a gate dielectric |
Haowen Bu, Hiroaki Niimi, Husam N. Alshareef |
2016-07-19 |
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System and method for mitigating oxide growth in a gate dielectric |
Haowen Bu, Hiroaki Niimi, Husam N. Alshareef |
2016-06-14 |
$24,396,000 |
| 9337046 |
System and method for mitigating oxide growth in a gate dielectric |
Haowen Bu, Hiroaki Niimi, Husam N. Alshareef |
2016-05-10 |
$12,044,000 |
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System and method for mitigating oxide growth in a gate dielectric |
Haowen Bu, Hiroaki Niimi, Husam N. Alshareef |
2016-05-10 |
$12,044,000 |
