Issued Patents All Time
Showing 25 most recent of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11710764 | IC with 3D metal-insulator-metal capacitor | Poornika Fernandes, Sagnik Dey, Luigi Colombo, Scott R. Summerfelt, Mark Visokay +1 more | 2023-07-25 |
| 11670671 | Precision capacitor | Poornika Fernandes, Luigi Colombo | 2023-06-06 |
| 11569342 | Precision capacitor | Poornika Fernandes, Luigi Colombo | 2023-01-31 |
| 10964778 | Precision capacitor | Poornika Fernandes, Luigi Colombo | 2021-03-30 |
| 10644098 | Precision capacitor | Poornika Fernandes, Luigi Colombo | 2020-05-05 |
| 10157915 | Capacitor with improved voltage coefficients | Bhaskar Srinivasan, Shih Chang Chang, Poornika Fernandes, Guru Mathur | 2018-12-18 |
| 10068771 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Hiroaki Niimi, Husam N. Alshareef | 2018-09-04 |
| 9892927 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Hiroaki Niimi, Husam N. Alshareef | 2018-02-13 |
| 9779946 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Hiroaki Niimi, Husam N. Alshareef | 2017-10-03 |
| 9583336 | Process to enable ferroelectric layers on large area substrates | Bhaskar Srinivasan, Asad Haider, Brian E. Goodlin, Roger C. McDermott | 2017-02-28 |
| 9576804 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Hiroaki Niimi, Husam N. Alshareef | 2017-02-21 |
| 9396951 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Hiroaki Niimi, Husam N. Alshareef | 2016-07-19 |
| 9368355 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Hiroaki Niimi, Husam N. Alshareef | 2016-06-14 |
| 9337046 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Hiroaki Niimi, Husam N. Alshareef | 2016-05-10 |
| 9337044 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Hiroaki Niimi, Husam N. Alshareef | 2016-05-10 |
| 9305998 | Adhesion of ferroelectric material to underlying conductive capacitor plate | Bhaskar Srinivasan, Eric H. Warninghoff, Alan G. Merriam, Brian E. Goodlin, Manoj Kumar Jain | 2016-04-05 |
| 9177806 | System and method for mitigating oxide growth in a gate dielectric | Malcolm J. Bevan, Hiroaki Niimi, Husam N. Alshareef | 2015-11-03 |
| 8962350 | Multi-step deposition of ferroelectric dielectric material | Bhaskar Srinivasan, Brian E. Goodlin, Mark Visokay | 2015-02-24 |
| 8822236 | Hydrogen-blocking film for ferroelectric capacitors | Bo-Yang Lin, Yen Lee, Mark Visokay | 2014-09-02 |
| 8809141 | High performance CMOS transistors using PMD liner stress | Rajesh Khamankar, Douglas T. Grider | 2014-08-19 |
| 8546259 | Nickel silicide formation for semiconductor components | Juanita DeLoach, Jiong-Ping Lu | 2013-10-01 |
| 8471307 | In-situ carbon doped e-SiGeCB stack for MOS transistor | Rajesh Khamankar, Douglas T. Grider | 2013-06-25 |
| 8114784 | Laminated stress overlayer using In-situ multiple plasma treatments for transistor improvement | Che-Jen Hu, Rajesh Khamankar | 2012-02-14 |
| 8101476 | Stress memorization dielectric optimized for NMOS and PMOS | Kanan Garg, Mahalingam Nandakumar, Song Zhao | 2012-01-24 |
| 8084312 | Nitrogen based implants for defect reduction in strained silicon | Srinivasan Chakravarthi, P R Chidambaram, Rajesh Khamankar, Douglas T. Grider | 2011-12-27 |