Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12249511 | Treatments to improve device performance | Steven C. H. Hung, Lin Dong, Benjamin Colombeau, Linlin Wang | 2025-03-11 |
| 11923441 | Gate all around I/O engineering | Steven C. H. Hung, Benjamin Colombeau, Andy Lo, Byeong-Chan Lee, Theresa Kramer Guarini +1 more | 2024-03-05 |
| 11529592 | Gas injector with baffle | Vishwas Kumar Pandey, Lara Hawrylchak, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen +4 more | 2022-12-20 |
| 11456178 | Gate interface engineering with doped layer | Steven C. H. Hung, Benjamin Colombeau, Abhishek Dube, Sheng-Chin Kung, Patricia M. Liu +1 more | 2022-09-27 |
| 11450759 | Gate all around I/O engineering | Steven C. H. Hung, Benjamin Colombeau, Andy Lo, Byeong-Chan Lee, Theresa Kramer Guarini +1 more | 2022-09-20 |
| 11322347 | Conformal oxidation processes for 3D NAND | Taewan Kim, Christopher S. Olsen, Erika HANSEN | 2022-05-03 |
| 11271097 | Cap oxidation for FinFET formation | Steven C. H. Hung, Benjamin Colombeau, Abhishek Dube, Sheng-Chin Kung, Patricia M. Liu +1 more | 2022-03-08 |
| 11189479 | Diffusion barrier layer | Benjamin Colombeau, Steven C. H. Hung | 2021-11-30 |
| 11077410 | Gas injector with baffle | Vishwas Kumar Pandey, Lara Hawrylchak, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen +4 more | 2021-08-03 |
| 10872763 | Treatments to enhance material structures | David Chu, Steven C. H. Hung, Malcolm J. Bevan, Charles Chu, Tatsuya Sato +2 more | 2020-12-22 |
| 9530898 | Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof | Udayan Ganguly, Yoshitaka Yokota, Jing Tang, Sunderraj Thirupapuliyur, Christopher S. Olsen +6 more | 2016-12-27 |
| 9048190 | Methods and apparatus for processing substrates using an ion shield | Jeffrey Tobin, Bernard L. Hwang, Canfeng Lai, Lara Hawrylchak, Wei Liu | 2015-06-02 |
| 9012336 | Method for conformal treatment of dielectric films using inductively coupled plasma | Heng Pan, Matthew S. Rogers, Christopher S. Olsen, Wei Liu, David Chu +1 more | 2015-04-21 |
| 8999106 | Apparatus and method for controlling edge performance in an inductively coupled plasma chamber | Wei Liu, Hanh Nguyen, Son T. Nguyen, Roger Curtis, Philip A. Bottini +1 more | 2015-04-07 |
| 8993458 | Methods and apparatus for selective oxidation of a substrate | Agus Sofian Tjandra, Christopher S. Olsen, Lara Hawrylchak | 2015-03-31 |
| 8871645 | Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof | Udayan Ganguly, Yoshita Yokota, Jing Tang, Sunderraj Thirupapuliyur, Christopher S. Olsen +6 more | 2014-10-28 |
| 8546273 | Methods and apparatus for forming nitrogen-containing layers | Malcolm J. Bevan, Son T. Nguyen, Wei Liu, Jose Antonio Marin, Jian Li | 2013-10-01 |
| 8481433 | Methods and apparatus for forming nitrogen-containing layers | Malcolm J. Bevan, Son T. Nguyen, Wei Liu, Jose Antonio Marin, Jian Li | 2013-07-09 |
| 8435906 | Methods for forming conformal oxide layers on semiconductor devices | Agus Sofian Tjandra, Christopher S. Olsen, Yoshitaka Yokota | 2013-05-07 |
| 8062472 | Method of correcting baseline skew by a novel motorized source coil assembly | Wei Liu, Hanh Nguyen, Son T. Nguyen, Roger Curtis, Philip A. Bottini | 2011-11-22 |
| 7910497 | Method of forming dielectric layers on a substrate and apparatus therefor | Christopher S. Olsen, Tejal Goyani | 2011-03-22 |
| 7813895 | Methods for plasma matching between different chambers and plasma stability monitoring and control | Sairaju Tallavarjula, Aaron Muir Hunter, Joseph M. Ranish, Robert Haney | 2010-10-12 |
| 7601648 | Method for fabricating an integrated gate dielectric layer for field effect transistors | Thai Cheng Chua, Shankar Muthukrisnan, Shreyas Kher, Chikuang Charles Wang, Giuseppina Conti +1 more | 2009-10-13 |
| 6022587 | Method and apparatus for improving film deposition uniformity on a substrate | H. Peter W. Hey, Vedapuram S. Achutharaman | 2000-02-08 |
| 6019839 | Method and apparatus for forming an epitaxial titanium silicide film by low pressure chemical vapor deposition | Vedapuram S. Achutharaman | 2000-02-01 |