Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7427338 | Flow diffuser to be used in electro-chemical plating system | Yezdi Dordi, Joseph Stevens, Donald Olgado | 2008-09-23 |
| 6881318 | Dynamic pulse plating for high aspect ratio features | Yezdi Dordi | 2005-04-19 |
| 6837978 | Deposition uniformity control for electroplating apparatus, and associated method | Yezdi Dordi, Donald Olgado, Mark Denome | 2005-01-04 |
| 6585876 | Flow diffuser to be used in electro-chemical plating system and method | Yezdi Dordi, Joseph Stevens, Donald Olgado | 2003-07-01 |
| 6551484 | Reverse voltage bias for electro-chemical plating system and method | Yezdi Dordi | 2003-04-22 |
| 6551488 | Segmenting of processing system into wet and dry areas | Michael Sugarman, Mark Denome | 2003-04-22 |
| 6514671 | Interconnect line formed by dual damascene using dielectric layers having dissimilar etching characteristics | Suketu Arun Parikh, Mehul Naik, Samuel Broydo | 2003-02-04 |
| 6130105 | Deposition rate control on wafers with varying characteristics | Gregory Redinbo | 2000-10-10 |
| 6022587 | Method and apparatus for improving film deposition uniformity on a substrate | Vedapuram S. Achutharaman, Johanes F. Swenberg | 2000-02-08 |
| 5899752 | Method for in-situ cleaning of native oxide from silicon surfaces | David W. Carlson | 1999-05-04 |
| 5834059 | Process of depositing a layer of material on a wafer with susceptor back coating | Roger N. Anderson, Israel Beinglass, Mahalingam Venkatesan | 1998-11-10 |
| 5725673 | Semiconductor wafer process chamber with susceptor back coating | Roger N. Anderson, Israel Beinglass, Mahalingam Venkatesan | 1998-03-10 |
| 5599397 | Semiconductor wafer process chamber with suspector back coating | Roger N. Anderson, Israel Beinglass, Mahalingam Venkatesan | 1997-02-04 |
| 5551982 | Semiconductor wafer process chamber with susceptor back coating | Roger N. Anderson, Israel Beinglass, Mahalingam Venkatesan | 1996-09-03 |
| 5482739 | Silicon nitride deposition | David W. Carlson | 1996-01-09 |
| 5421957 | Low temperature etching in cold-wall CVD systems | David K. Carlson, James Hann | 1995-06-06 |
| 5091217 | Method for processing wafers in a multi station common chamber reactor | William A. Mazak, Ravinder Aggarwal, John H. Curtin, Paul Brown, Joe R. Smith | 1992-02-25 |
| 4987856 | High throughput multi station processor for multiple single wafers | William A. Mazak, Ravinder Aggarwal, John H. Curtin | 1991-01-29 |