Issued Patents All Time
Showing 25 most recent of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9587789 | Methods and apparatus for providing a gas mixture to a pair of process chambers | Jared Ahmad Lee, Martin Jeffrey Salinas, Ezra Robert Gold | 2017-03-07 |
| 9155134 | Methods and apparatus for rapidly responsive heat control in plasma processing devices | Chunlei Zhang, Richard Fovell, Ezra Robert Gold, Ajit Balakrishna | 2015-10-06 |
| 8992689 | Method for removing halogen-containing residues from substrate | Adauto Diaz, Andrew Nguyen, Benjamin Schwarz, Eu Jin Lim, Jared Ahmad Lee +4 more | 2015-03-31 |
| 8931512 | Gas delivery system and method of use thereof | Ezra Robert Gold, John W. Lane | 2015-01-13 |
| 8895889 | Methods and apparatus for rapidly responsive heat control in plasma processing devices | Chunlei Zhang, Richard Fovell, Ezra Robert Gold, Ajit Balakrishna | 2014-11-25 |
| 8845816 | Method extending the service interval of a gas distribution plate | Adauto Diaz, Andrew Nguyen, Benjamin Schwarz, Eu Jin Lim, Jared Ahmad Lee +4 more | 2014-09-30 |
| 8721798 | Methods for processing substrates in process systems having shared resources | Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz, Kenneth S. Collins +3 more | 2014-05-13 |
| 8707754 | Methods and apparatus for calibrating flow controllers in substrate processing systems | John W. Lane, Mariusch Gregor, Duc Dang Buckius, Berrin Daran, Corie Lynn Cobb +2 more | 2014-04-29 |
| 8616043 | Methods and apparatus for calibrating pressure gauges in a substrate processing system | Ezra Robert Gold, Jared Ahmad Lee, Ming Xu | 2013-12-31 |
| 8616224 | Methods and apparatus for providing a gas mixture to a pair of process chambers | Jared Ahmad Lee, Martin Jeff Salinas, Ezra Robert Gold | 2013-12-31 |
| 8562742 | Apparatus for radial delivery of gas to a chamber and methods of use thereof | Jared Ahmad Lee, Martin Jeff Salinas, Ankur Agarwal, Ezra Robert Gold, Aniruddha Pal +1 more | 2013-10-22 |
| 8513889 | Methods and apparatus for tuning matching networks | Chunlei Zhang, Sergio Fukuda Shoji, Andrey Semenin, Kartik Ramaswamy, Bryan Liao | 2013-08-20 |
| 8496756 | Methods for processing substrates in process systems having shared resources | Dermot Cantwell, Ming Xu, Charles Hardy, Benjamin Schwarz, Kenneth S. Collins +3 more | 2013-07-30 |
| 8473247 | Methods for monitoring processing equipment | Dermot Cantwell, Michael R. Rice, Thorsten Kril, Charles Hardy | 2013-06-25 |
| 8454756 | Methods for extending the lifetime of pressure gauges coupled to substrate process chambers | — | 2013-06-04 |
| 8237517 | Apparatus for multiple frequency power application | Steven C. Shannon, Jang-Gyoo Yang, Matthew L. Miller, Kartik Ramaswamy | 2012-08-07 |
| 8144329 | Low power RF tuning using optical and non-reflected power methods | Theresa Kramer Guarini, Jeffrey Charles Pierce | 2012-03-27 |
| 8097088 | Methods for processing substrates in a dual chamber processing system having shared resources | Eu Jin Lim, Adauto Diaz, Benjamin Schwarz, Charles Hardy | 2012-01-17 |
| 8080479 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-20 |
| 8074677 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, Richard Fovell, Jared Ahmad Lee, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2011-12-13 |
| 8076247 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-13 |
| 7994872 | Apparatus for multiple frequency power application | Steven C. Shannon, Jang-Gyoo Yang, Matthew L. Miller, Kartik Ramaswamy | 2011-08-09 |
| 7988815 | Plasma reactor with reduced electrical skew using electrical bypass elements | Shahid Rauf, Kenneth S. Collins, Kallol Bera, Kartik Ramaswamy, Hiroji Hanawa +5 more | 2011-08-02 |
| 7975558 | Method and apparatus for gas flow measurement | Jared Ahmad Lee, Ezra Robert Gold, Chunlei Zhang, Richard Fovell | 2011-07-12 |
| 7968469 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-06-28 |