Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12237682 | Efficient hierarchical distributed power storage | Robert Fanfelle | 2025-02-25 |
| 11359769 | Gas cartridge loaded dispensing device | Robert Fanfelle | 2022-06-14 |
| 9848474 | Lighting nodes having a core node and sensor pods | Kent W. Ryhorchuk, Carlos Henriquez, David Vucich, Shin-Li Cecily Liu | 2017-12-19 |
| 9587789 | Methods and apparatus for providing a gas mixture to a pair of process chambers | Jared Ahmad Lee, Martin Jeffrey Salinas, James P. Cruse | 2017-03-07 |
| 9565732 | Lighting nodes having a core node and sensor pods | Kent W. Ryhorchuk, Carlos Henriquez, David Vucich, Shin-Li Cecily Liu | 2017-02-07 |
| 9155134 | Methods and apparatus for rapidly responsive heat control in plasma processing devices | Chunlei Zhang, Richard Fovell, Ajit Balakrishna, James P. Cruse | 2015-10-06 |
| 9088357 | Imaging system for passive alignment of engines | Benoit Sevigny | 2015-07-21 |
| 8931512 | Gas delivery system and method of use thereof | James P. Cruse, John W. Lane | 2015-01-13 |
| 8895889 | Methods and apparatus for rapidly responsive heat control in plasma processing devices | Chunlei Zhang, Richard Fovell, Ajit Balakrishna, James P. Cruse | 2014-11-25 |
| 8616043 | Methods and apparatus for calibrating pressure gauges in a substrate processing system | James P. Cruse, Jared Ahmad Lee, Ming Xu | 2013-12-31 |
| 8616224 | Methods and apparatus for providing a gas mixture to a pair of process chambers | Jared Ahmad Lee, Martin Jeff Salinas, James P. Cruse | 2013-12-31 |
| 8562742 | Apparatus for radial delivery of gas to a chamber and methods of use thereof | Jared Ahmad Lee, Martin Jeff Salinas, Ankur Agarwal, James P. Cruse, Aniruddha Pal +1 more | 2013-10-22 |
| 8231799 | Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Paul Brillhart, Bruno Geoffrion +2 more | 2012-07-31 |
| 8074677 | Method and apparatus for controlling gas flow to a processing chamber | Richard Fovell, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2011-12-13 |
| 8048806 | Methods to avoid unstable plasma states during a process transition | Michael Kutney, Daniel J. Hoffman, Gerardo Delgadino, Ashok Sinha, Xiaoye Zhao +2 more | 2011-11-01 |
| 7975558 | Method and apparatus for gas flow measurement | Jared Ahmad Lee, Chunlei Zhang, James P. Cruse, Richard Fovell | 2011-07-12 |
| 7910013 | Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure | Daniel J. Hoffman | 2011-03-22 |
| 7901952 | Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters | Daniel J. Hoffman | 2011-03-08 |
| 7846497 | Method and apparatus for controlling gas flow to a processing chamber | Richard Fovell, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2010-12-07 |
| 7795153 | Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters | Daniel J. Hoffman | 2010-09-14 |
| 7775236 | Method and apparatus for controlling gas flow to a processing chamber | Richard Fovell, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2010-08-17 |
| 7743670 | Method and apparatus for gas flow measurement | Jared Lee, Chunlei Zhang, James P. Cruse, Richard Fovell | 2010-06-29 |
| 7541292 | Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Paul Brillhart, Bruno Geoffrion +2 more | 2009-06-02 |
| 7540971 | Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Paul Brillhart, Bruno Geoffrion +2 more | 2009-06-02 |
| 7470626 | Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure | Daniel J. Hoffman | 2008-12-30 |