Issued Patents All Time
Showing 25 most recent of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405164 | Spatial optical emission spectroscopy for etch uniformity | Blake Erickson, Keith R. Berding, Zhaozhao Zhu, Tsung Feng Wu, Michael D. Willwerth +1 more | 2025-09-02 |
| 12339645 | Estimation of chamber component conditions using substrate measurements | Chunlei Zhang, Zhaozhao Zhu | 2025-06-24 |
| 12283503 | Substrate measurement subsystem | Upendra Ummethala, Blake Erickson, Prashanth Kumar, Steven Trey Tindel, Zhaozhao Zhu | 2025-04-22 |
| 12216455 | Chamber component condition estimation using substrate measurements | Chunlei Zhang, Zhaozhao Zhu | 2025-02-04 |
| 12191176 | Integrated substrate measurement system to improve manufacturing process performance | Upendra Ummethala, Blake Erickson, Prashanth Kumar, Steven Trey Tindel, Zhaozhao Zhu | 2025-01-07 |
| 12148647 | Integrated substrate measurement system | Patricia A. Schulze, Gregory John Freeman, Arunkumar Ramachandraiah, Chih Chung Chou, Zhaozhao Zhu +1 more | 2024-11-19 |
| 12066639 | Adjustable achromatic collimator assembly for endpoint detection systems | Pengyu Han, John Anthony O'MALLEY, III, Michael N. Grimbergen, Lei Lian, Upendra Ummethala | 2024-08-20 |
| 11927543 | Multiple reflectometry for measuring etch parameters | Blake Erickson, Keith R. Berding, Soumendra N. Barman, Zhaozhao Zhu, Michelle SanPedro +1 more | 2024-03-12 |
| 11719952 | Adjustable achromatic collimator assembly for endpoint detection systems | Pengyu Han, John Anthony O'MALLEY, III, Michael N. Grimbergen, Lei Lian, Upendra Ummethala | 2023-08-08 |
| 11688616 | Integrated substrate measurement system to improve manufacturing process performance | Upendra Ummethala, Blake Erickson, Prashanth Kumar, Steven Trey Tindel, Zhaozhao Zhu | 2023-06-27 |
| 11668602 | Spatial optical emission spectroscopy for etch uniformity | Blake Erickson, Keith R. Berding, Zhaozhao Zhu, Tsung Feng Wu, Michael D. Willwerth +1 more | 2023-06-06 |
| 11619594 | Multiple reflectometry for measuring etch parameters | Blake Erickson, Keith R. Berding, Soumendra N. Barman, Zhaozhao Zhu, Michelle SanPedro +1 more | 2023-04-04 |
| D977504 | Portion of a display panel with a graphical user interface | Upendra Ummethala, Blake Erickson, Prashanth Kumar, Steven Trey Tindel, Zhaozhao Zhu | 2023-02-07 |
| 11289387 | Methods and apparatus for backside via reveal processing | Prayudi Lianto, Sik Hin Chi, SHIH-CHAO HUNG, Pin Gian Gan, Ricardo Fujii Vinluan +10 more | 2022-03-29 |
| 11150120 | Low temperature thermal flow ratio controller | Ashley M. Okada | 2021-10-19 |
| 11054184 | Methods and apparatus for processing a substrate to remove moisture and/or residue | — | 2021-07-06 |
| 10247473 | Methods and apparatus for processing a substrate to remove moisture and/or residue | — | 2019-04-02 |
| 9982786 | Valve with adjustable hard stop | — | 2018-05-29 |
| 9685655 | Complex showerhead coating apparatus with electrospray for lithium ion battery | Fei Wang, Hooman Bolandi, Connie P. Wang, Victor Pebenito, Siqing Lu +2 more | 2017-06-20 |
| 8617351 | Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction | Daniel J. Hoffman, Roger Alan Lindley, Martin Jeff Salinas, Hamid Tavassoli, Keiji Horioka +1 more | 2013-12-31 |
| 8440019 | Lower liner with integrated flow equalizer and improved conductance | James D. Carducci, Andrew Nguyen, Ajit Balakrishna | 2013-05-14 |
| 8382939 | Plasma processing chamber with enhanced gas delivery | Roger Alan Lindley | 2013-02-26 |
| 8313578 | Etching chamber having flow equalizer and lower liner | James D. Carducci, Kin Pong Lo, Kallol Bera, Matthew L. Miller | 2012-11-20 |
| 8282736 | Lower liner with integrated flow equalizer and improved conductance | James D. Carducci, Andrew Nguyen, Ajit Balakrishna | 2012-10-09 |
| 8118938 | Lower liner with integrated flow equalizer and improved conductance | James D. Carducci, Andrew Nguyen, Ajit Balakrishna | 2012-02-21 |