Issued Patents All Time
Showing 25 most recent of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12066639 | Adjustable achromatic collimator assembly for endpoint detection systems | Pengyu Han, John Anthony O'MALLEY, III, Lei Lian, Upendra Ummethala, Michael Kutney | 2024-08-20 |
| 12007686 | Etch processing system having reflective endpoint detection | Khiem K. Nguyen | 2024-06-11 |
| 11719952 | Adjustable achromatic collimator assembly for endpoint detection systems | Pengyu Han, John Anthony O'MALLEY, III, Lei Lian, Upendra Ummethala, Michael Kutney | 2023-08-08 |
| 11022877 | Etch processing system having reflective endpoint detection | Khiem K. Nguyen | 2021-06-01 |
| 10595365 | Chamber lid heater ring assembly | Alan Ouye, Graeme Scott, Keven Yu | 2020-03-17 |
| 10453696 | Dual endpoint detection for advanced phase shift and binary photomasks | — | 2019-10-22 |
| 10170280 | Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall | Madhavi R. Chandrachood, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2019-01-01 |
| 9805939 | Dual endpoint detection for advanced phase shift and binary photomasks | — | 2017-10-31 |
| 9378930 | Inductively coupled plasma reactor having RF phase control and methods of use thereof | Alan Ouye, Valentin N. Todorow | 2016-06-28 |
| 9218944 | Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors | Madhavi R. Chandrachood, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2015-12-22 |
| 9142467 | Etch rate detection for anti-reflective coating layer and absorber layer etching | — | 2015-09-22 |
| 8961804 | Etch rate detection for photomask etching | — | 2015-02-24 |
| 8956809 | Apparatus and methods for etching quartz substrate in photomask manufacturing applications | — | 2015-02-17 |
| 8900469 | Etch rate detection for anti-reflective coating layer and absorber layer etching | — | 2014-12-02 |
| 8808559 | Etch rate detection for reflective multi-material layers etching | — | 2014-08-19 |
| 8778204 | Methods for reducing photoresist interference when monitoring a target layer in a plasma process | — | 2014-07-15 |
| 8158526 | Endpoint detection for photomask etching | — | 2012-04-17 |
| 8092695 | Endpoint detection for photomask etching | — | 2012-01-10 |
| 8017029 | Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside | Madhavi R. Chandrachood, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2011-09-13 |
| 8012366 | Process for etching a transparent workpiece including backside endpoint detection steps | Richard Lewington, Khiem K. Nguyen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar | 2011-09-06 |
| 8002946 | Mask etch plasma reactor with cathode providing a uniform distribution of etch rate | Richard Lewington, Khiem K. Nguyen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar | 2011-08-23 |
| 7976671 | Mask etch plasma reactor with variable process gas distribution | Madhavi R. Chandrachood, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2011-07-12 |
| 7967930 | Plasma reactor for processing a workpiece and having a tunable cathode | Richard Lewington, Khiem K. Nguyen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar | 2011-06-28 |
| 7829243 | Method for plasma etching a chromium layer suitable for photomask fabrication | Xiaoyi Chen, Madhavi R. Chandrachood, Jeffrey X. Tran, Ajay Kumar, Simon W. Tam +1 more | 2010-11-09 |
| 7635546 | Phase shifting photomask and a method of fabricating thereof | Scott Anderson, Xiaoyi Chen, Ajay Kumar | 2009-12-22 |