Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7632419 | Apparatus and method for monitoring processing of a substrate | Shaoher X. Pan | 2009-12-15 |
| 7520999 | Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another | Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more | 2009-04-21 |
| 7504041 | Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator | Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more | 2009-03-17 |
| 7431797 | Plasma reactor with a dynamically adjustable plasma source power applicator | Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more | 2008-10-07 |
| 7419551 | Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another | Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim +2 more | 2008-09-02 |
| 6835275 | Reducing deposition of process residues on a surface in a chamber | Xue-Yu Qian | 2004-12-28 |
| 6824813 | Substrate monitoring method and apparatus | Thorsten Lill, Jitske Trevor, Wei-Nan Jiang, Jeffrey D. Chinn | 2004-11-30 |
| 6712927 | Chamber having process monitoring window | Xue-Yu Qian | 2004-03-30 |
| 6632321 | Method and apparatus for monitoring and controlling wafer fabrication process | Thorsten Lill, David Mui | 2003-10-14 |
| 6534756 | Ultra-stable, compact, high intensity fiber-coupled light source for use in monitoring and process control | — | 2003-03-18 |
| 6406924 | Endpoint detection in the fabrication of electronic devices | Thorsten Lill | 2002-06-18 |
| 6390019 | Chamber having improved process monitoring window | Xue-Yu Qian | 2002-05-21 |
| 6352049 | Plasma assisted processing chamber with separate control of species density | Gerald Yin, Arnold Kolandenko, Hong Ching Shan, Peter Loewenhardt, Chii Guang Lee +9 more | 2002-03-05 |
| 6284665 | Method for controlling the shape of the etch front in the etching of polysilicon | Thorsten Lill | 2001-09-04 |
| 6129807 | Apparatus for monitoring processing of a substrate | Shaoher X. Pan | 2000-10-10 |
| 6081334 | Endpoint detection for semiconductor processes | Thorsten Lill | 2000-06-27 |
| 6074954 | Process for control of the shape of the etch front in the etching of polysilicon | Thorsten Lill | 2000-06-13 |