Issued Patents All Time
Showing 25 most recent of 59 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8801892 | Uniform etch system | Dean J. Larson, Babak Kadkhodayan, Di Wu, Kenji Takeshita, Bi-Ming Yen +2 more | 2014-08-12 |
| 8573153 | Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode | Andreas Fischer, William S. Kennedy, David Trussell | 2013-11-05 |
| 8430970 | Methods for preventing corrosion of plasma-exposed yttria-coated constituents | Ganapathy Swami, Yunsang Kim | 2013-04-30 |
| 8337713 | Methods for RF pulsing of a narrow gap capacitively coupled reactor | Mukund Srinivasan, Andreas Fischer | 2012-12-25 |
| 7976673 | RF pulsing of a narrow gap capacitively coupled reactor | Mukund Srinivasan, Andreas Fischer | 2011-07-12 |
| 7861667 | Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode | Andreas Fischer, William S. Kennedy, David Trussell | 2011-01-04 |
| 7601246 | Methods of sputtering a protective coating on a semiconductor substrate | Jisoo Kim, Jong Shon, Biming Yen | 2009-10-13 |
| 7597816 | Wafer bevel polymer removal | Jeremy Chang, Andreas Fischer | 2009-10-06 |
| 7385287 | Preventing damage to low-k materials during resist stripping | Siyi Li, Helen Zhu, Howard Dang, Thomas S. Choi | 2008-06-10 |
| 7371332 | Uniform etch system | Dean J. Larson, Babak Kadkhodayan, Di Wu, Kenji Takeshita, Bi-Ming Yen +2 more | 2008-05-13 |
| 7363876 | Multi-core transformer plasma source | Canfeng Lai, Michael S. Cox, Tsutomu Tanaka, Shamouil Shamouilian | 2008-04-29 |
| 7294580 | Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition | Seokmin Yun, Ji Zhu, Peter Cirigliano, Sangheon Lee, Thomas S. Choi +4 more | 2007-11-13 |
| 7244336 | Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift | Andreas Fischer | 2007-07-17 |
| 7226852 | Preventing damage to low-k materials during resist stripping | Siyi Li, Helen Zhu, Howard Dang, Thomas S. Choi | 2007-06-05 |
| 7211518 | Waferless automatic cleaning after barrier removal | Xiaoqiang Yao, Bi-Ming Yen, Taejoon Han | 2007-05-01 |
| 7169231 | Gas distribution system with tuning gas | Dean J. Larson, Babak Kadkhodayan, Di Wu, Kenji Takeshita, Bi-Ming Yen +2 more | 2007-01-30 |
| 7078350 | Methods for the optimization of substrate etching in a plasma processing system | Jisoo Kim, Binet Worsham, Bi-Ming Yen | 2006-07-18 |
| 7041230 | Method for selectively etching organosilicate glass with respect to a doped silicon carbide | Xingcai Su, Bi-Ming Yen | 2006-05-09 |
| 6979579 | Methods and apparatus for inspecting contact openings in a plasma processing system | Jisoo Kim, Sangheon Lee, Sean S. Kang, Binet Worsham, Bi-Ming Yen +1 more | 2005-12-27 |
| 6949469 | Methods and apparatus for the optimization of photo resist etching in a plasma processing system | Yu-Huei Cheng, Helen Zhu, Vinay V. Phoray, Hanzhong Xiao | 2005-09-27 |
| 6949460 | Line edge roughness reduction for trench etch | Eric Wagganer, Helen Zhu, Daniel Le | 2005-09-27 |
| 6841943 | Plasma processor with electrode simultaneously responsive to plural frequencies | Vahid Vahedi, Albert R. Ellingboe, Andras Kuthi, Andreas Fischer | 2005-01-11 |
| 6822185 | Temperature controlled dome-coil system for high power inductively coupled plasma systems | Michael Welch, Paul Luscher, Siamak Salimian, Rolf Guenther, Zhong Qiang Hua +1 more | 2004-11-23 |
| 6755150 | Multi-core transformer plasma source | Canfeng Lai, Michael S. Cox, Tsutomu Tanaka, Shamouil Shamouilian | 2004-06-29 |
| 6744212 | Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions | Andreas Fischer, Dave Trussell, Bill Kennedy | 2004-06-01 |