Issued Patents All Time
Showing 1–25 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7399707 | In situ application of etch back for improved deposition into high-aspect-ratio features | Padmanabhan Krishnaraj, Pavel Ionov, Canfeng Lai, Michael S. Cox | 2008-07-15 |
| 7363876 | Multi-core transformer plasma source | Canfeng Lai, Michael S. Cox, Peter Loewenhardt, Tsutomu Tanaka | 2008-04-29 |
| 6869880 | In situ application of etch back for improved deposition into high-aspect-ratio features | Padmanabhan Krishnaraj, Pavel Ionov, Canfeng Lai, Michael S. Cox | 2005-03-22 |
| 6863019 | Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas | Canfeng Lai, Michael S. Cox, Padmanabhan Krishnaraj, Tsutomu Tanaka, Sebastien Raoux +2 more | 2005-03-08 |
| 6824748 | Heated catalytic treatment of an effluent gas from a substrate fabrication process | Tony Kaushal, Harshad Borgaonkar, Kwok Manus Wong, Michael G. Chafin, Ashish Bhatnagar | 2004-11-30 |
| 6755150 | Multi-core transformer plasma source | Canfeng Lai, Michael S. Cox, Peter Loewenhardt, Tsutomu Tanaka | 2004-06-29 |
| 6730175 | Ceramic substrate support | Joseph Yudovsky, Salvador P. Umotoy, Ron Rose, Rita Dukes, Xiaoxiong Yuan | 2004-05-04 |
| 6726804 | RF power delivery for plasma processing using modulated power signal | Liang Wang, Kwok Manus Wong, Kartik Ramaswamy | 2004-04-27 |
| 6721162 | Electrostatic chuck having composite dielectric layer and method of manufacture | Edwin C. Weldon, Kenneth S. Collins, Arik Donde, Brian Lue, Dan Maydan +8 more | 2004-04-13 |
| 6712020 | Toroidal plasma source for plasma processing | Michael S. Cox, Canfeng Lai, Robert B. Majewski, David Wanamaker, Christopher T. Lane +2 more | 2004-03-30 |
| 6689252 | Abatement of hazardous gases in effluent | Tony Kaushal | 2004-02-10 |
| 6682627 | Process chamber having a corrosion-resistant wall and method | Jennifer Y. Sun, Ananda H. Kumar | 2004-01-27 |
| 6673323 | Treatment of hazardous gases in effluent | Ashish Bhatnagar, Tony Kaushal, Kwok Manus Wong | 2004-01-06 |
| 6639783 | Multi-layer ceramic electrostatic chuck with integrated channel | You Wang, Ananda H. Kumar | 2003-10-28 |
| 6635144 | Apparatus and method for detecting an end point of chamber cleaning in semiconductor equipment | Zhenjiang Cui, Padmanabhan Krishnaraj | 2003-10-21 |
| 6583980 | Substrate support tolerant to thermal expansion stresses | You Wang, Arnold Kholodenko, Alexander Veytser, Wing Cheng | 2003-06-24 |
| 6581612 | Chamber cleaning with fluorides of iodine | Peter Loewenhardt, Pavel Ionov, Pamanabhan Krishnaraj | 2003-06-24 |
| 6581275 | Fabricating an electrostatic chuck having plasma resistant gas conduits | Kadthala Ramaya Narendrnath, Dennis S. Grimard | 2003-06-24 |
| 6557248 | Method of fabricating an electrostatic chuck | Manoocher Birang, John F. Cameron, Chandra Deshpandey, Alfred Goldspeil, Ron Northrup +2 more | 2003-05-06 |
| 6538872 | Electrostatic chuck having heater and method | You Wang, Arnold Kholodenko, Alexander Veytser, Surinder Bedi, Kadthala Ramaya Narendrnath +4 more | 2003-03-25 |
| 6503368 | Substrate support having bonded sections and method | Arnold Kholodenko, Vijay D. Parkhe, You Wang, Wing Cheng, Alexander Veytser | 2003-01-07 |
| 6494958 | Plasma chamber support with coupled electrode | Jon McChesney, Kwok Manus Wong, Liang Wang, Alexander Veytser, Dennis S. Grimard | 2002-12-17 |
| 6490146 | Electrostatic chuck bonded to base with a bond layer and method | You Wang, Arnold Kholodenko, Alexander Veytser, Surinder Bedi, Kadthala Ramaya Narendrnath +4 more | 2002-12-03 |
| 6490144 | Support for supporting a substrate in a process chamber | Kadthala Ramaya Narendrnath, Syed H. Askari, Dennis S. Grimard, Surinder Bedi, Ananda H. Kumar | 2002-12-03 |
| 6481886 | Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system | Kadthala Ramaya Narendrnath, Liang Wang, Paul Luscher, Hamid Noorbakhsh | 2002-11-19 |