Issued Patents All Time
Showing 26–50 of 68 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6478924 | Plasma chamber support having dual electrodes | Arnold Kholodenko, Kwok Manus Wong, Liang Wang, Alexander Veytser, Dennis S. Grimard | 2002-11-12 |
| 6468490 | Abatement of fluorine gas from effluent | Mehran Moalem, Tony Kaushal | 2002-10-22 |
| 6462928 | Electrostatic chuck having improved electrical connector and method | You Wang, Surinder Bedi, Arnold Kholodenko, Alexander Veytser, Kadthala Ramaya Narendrnath +4 more | 2002-10-08 |
| 6449871 | Semiconductor process chamber having improved gas distributor | Arnold Kholodenko, Dmitry Lubomirsky, Guang-Jye Shiau, Peter Loewenhardt | 2002-09-17 |
| 6440221 | Process chamber having improved temperature control | Ananda H. Kumar, Kadthala Ramaya Narendrnath, Eric Askarinam, Edwin C. Weldon, Michael R. Rice +1 more | 2002-08-27 |
| 6432282 | Method and apparatus for supplying electricity uniformly to a workpiece | Anada H. Kumar, Donald Olgado, Joseph Stevens, Ricardo Leon, Jon Clinton | 2002-08-13 |
| 6418874 | Toroidal plasma source for plasma processing | Michael S. Cox, Canfeng Lai, Robert B. Majewski, David Wanamaker, Christopher T. Lane +2 more | 2002-07-16 |
| 6414834 | Dielectric covered electrostatic chuck | Edwin C. Weldon, Kenneth S. Collins, Arik Donde, Brian Lue, Dan Maydan +8 more | 2002-07-02 |
| 6391146 | Erosion resistant gas energizer | Ashish Bhatnagar, Kartik Ramaswamy, Tony Kaushal, Kwok Manus Wong | 2002-05-21 |
| 6370006 | Electrostatic chuck having a plurality of gas inlet channels | Ananda H. Kumar, Kadthala Ramaya Narendrnath | 2002-04-09 |
| 6367412 | Porous ceramic liner for a plasma source | Kartik Ramaswamy, Kwok Manus Wong, Ashish Bhatnagar, Mehran Moalem, Tony Kaushal | 2002-04-09 |
| 6320736 | Chuck having pressurized zones of heat transfer gas | Arnold Kholodenko, Siamak Salimian, Hamid Noorbakhsh, Efrain Quiles, Dennis S. Grimard | 2001-11-20 |
| 6310755 | Electrostatic chuck having gas cavity and method | Arnold Kholodenko, You Wang, Wing Cheng, Alexander Veytser, Surinder Bedi +4 more | 2001-10-30 |
| 6280584 | Compliant bond structure for joining ceramic to metal | Ananda H. Kumar, Kadthala Ramaya Narendrnath | 2001-08-28 |
| 6278600 | Electrostatic chuck with improved temperature control and puncture resistance | Arnold Kholodenko, Semyon L. Kats, Semyon Sherstinsky, Jon Clinton, Surinder Bedi | 2001-08-21 |
| 6273958 | Substrate support for plasma processing | Ananda H. Kumar, Siamak Salimian, Mahmoud Dahimene, Michael G. Chafin, Dennis S. Grimard | 2001-08-14 |
| 6267839 | Electrostatic chuck with improved RF power distribution | Ananda H. Kumar, Arnold Kholodenko | 2001-07-31 |
| 6217655 | Stand-off pad for supporting a wafer on a substrate support chuck | Ananda H. Kumar, Hyman J. Levinstein, Vijay D. Parkhe | 2001-04-17 |
| 6185839 | Semiconductor process chamber having improved gas distributor | Arnold Kholodenko, Dmitry Lubomirsky, Guang-Jye Shiau, Peter Loewenhardt | 2001-02-13 |
| 6151203 | Connectors for an electrostatic chuck and combination thereof | Ananda H. Kumar, Arnold Kholodenko, Dennis S. Grimard, Liang Wang, Gerhard Schneider +4 more | 2000-11-21 |
| 6108189 | Electrostatic chuck having improved gas conduits | Edwin C. Weldon, Kenneth S. Collins, Arik Donde, Brian Lue, Dan Maydan +8 more | 2000-08-22 |
| 6095084 | High density plasma process chamber | Ananda H. Kumar, Arnold Kholodenko, Dennis S. Grimard, Jonathan D. Mohn, Michael G. Chafin +1 more | 2000-08-01 |
| 6094334 | Polymer chuck with heater and method of manufacture | Surinder Bedi, Syed H. Askari, Arnold Kholodenko, Jon Clinton, Alexander Veytser +2 more | 2000-07-25 |
| 6055150 | Multi-electrode electrostatic chuck having fuses in hollow cavities | Jon Clinton, Mark Contreras, Anand KUMAR, You Wang, Surinder Bedi | 2000-04-25 |
| 6023405 | Electrostatic chuck with improved erosion resistance | Manoocher Birang, John F. Cameron, Chandra Deshpandey, Alfred Goldspeil, Ron Northrup +2 more | 2000-02-08 |