Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8279577 | Substrate support having fluid channel | Andrew Nguyen, Wing Cheng, Hiroji Hanawa, Semyon L. Kats, Kartik Ramaswamy +4 more | 2012-10-02 |
| 7768765 | Substrate support having heat transfer system | Andrew Nguyen, Wing Cheng, Hiroji Hanawa, Semyon L. Kats, Kartik Ramaswamy +4 more | 2010-08-03 |
| 7221553 | Substrate support having heat transfer system | Andrew Nguyen, Wing Cheng, Hiroji Hanawa, Semyon L. Kats, Kartik Ramaswamy +4 more | 2007-05-22 |
| 6824748 | Heated catalytic treatment of an effluent gas from a substrate fabrication process | Tony Kaushal, Shamouil Shamouilian, Harshad Borgaonkar, Michael G. Chafin, Ashish Bhatnagar | 2004-11-30 |
| 6759624 | Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber | Ananda H. Kumar, Tetsuya Ishikawa, Farahmand Askarinam | 2004-07-06 |
| 6726804 | RF power delivery for plasma processing using modulated power signal | Liang Wang, Shamouil Shamouilian, Kartik Ramaswamy | 2004-04-27 |
| 6673323 | Treatment of hazardous gases in effluent | Ashish Bhatnagar, Tony Kaushal, Shamouil Shamouilian | 2004-01-06 |
| 6642489 | Method and apparatus for improving exhaust gas consumption in an exhaust conduit | Kartik Ramaswamy, Dennis S. Grimard, Philip M. Salzman, Liang Wang | 2003-11-04 |
| 6494958 | Plasma chamber support with coupled electrode | Shamouil Shamouilian, Jon McChesney, Liang Wang, Alexander Veytser, Dennis S. Grimard | 2002-12-17 |
| 6478924 | Plasma chamber support having dual electrodes | Shamouil Shamouilian, Arnold Kholodenko, Liang Wang, Alexander Veytser, Dennis S. Grimard | 2002-11-12 |
| 6391146 | Erosion resistant gas energizer | Ashish Bhatnagar, Kartik Ramaswamy, Tony Kaushal, Shamouil Shamouilian | 2002-05-21 |
| 6367412 | Porous ceramic liner for a plasma source | Kartik Ramaswamy, Ashish Bhatnagar, Mehran Moalem, Tony Kaushal, Shamouil Shamouilian | 2002-04-09 |