Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11447868 | Method for controlling a plasma process | Andrew Nguyen, Kartik Ramaswamy, Yang Yang, Anilkumar Rayaroth, Lu Liu | 2022-09-20 |
| 10840062 | Radio frequency filter system for a processing chamber | Andrew Nguyen, Lu Liu, Anilkumar Rayaroth | 2020-11-17 |
| 10546731 | Method, apparatus and system for wafer dechucking using dynamic voltage sweeping | Haitao Wang, Kartik Ramaswamy, Yue Guo, Valentin N. Todorow, Kenny L. Doan +3 more | 2020-01-28 |
| 9601301 | Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment | Sergey G. Belostotskiy, Chinh Dinh, Andrew Nguyen | 2017-03-21 |
| 9070536 | Plasma reactor electrostatic chuck with cooled process ring and heated workpiece support surface | Michael D. Willwerth, David Palagashvili, Ying-Sheng Lin | 2015-06-30 |
| 8580693 | Temperature enhanced electrostatic chucking in plasma processing apparatus | Sergey G. Belostotskiy, Jingbao Liu, David Palagashvili | 2013-11-12 |
| 8270141 | Electrostatic chuck with reduced arcing | Michael D. Willwerth, David Palagashvili, Douglas A. Buchberger, Jr. | 2012-09-18 |
| 7838430 | Plasma control using dual cathode frequency mixing | Steven C. Shannon, Dennis S. Grimard, Theodoros Panagopoulos, Daniel J. Hoffman, Troy S. Detrick +4 more | 2010-11-23 |
| 7813103 | Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodes | Steven C. Shannon, Dennis S. Grimard | 2010-10-12 |
| 6824748 | Heated catalytic treatment of an effluent gas from a substrate fabrication process | Tony Kaushal, Shamouil Shamouilian, Harshad Borgaonkar, Kwok Manus Wong, Ashish Bhatnagar | 2004-11-30 |
| 6273958 | Substrate support for plasma processing | Shamouil Shamouilian, Ananda H. Kumar, Siamak Salimian, Mahmoud Dahimene, Dennis S. Grimard | 2001-08-14 |
| 6151203 | Connectors for an electrostatic chuck and combination thereof | Shamouil Shamouilian, Ananda H. Kumar, Arnold Kholodenko, Dennis S. Grimard, Liang Wang +4 more | 2000-11-21 |
| 6095084 | High density plasma process chamber | Shamouil Shamouilian, Ananda H. Kumar, Arnold Kholodenko, Dennis S. Grimard, Jonathan D. Mohn +1 more | 2000-08-01 |
| 5903428 | Hybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating same | Dennis S. Grimard, Vijay D. Parkhe, Hyman J. Levinstein, Fusen Chen | 1999-05-11 |
| 5636098 | Barrier seal for electrostatic chuck | Joseph F. Salfelder, Dennis S. Grimard, John F. Cameron, Chandra Deshpandey, Robert E. Ryan | 1997-06-03 |