| 11270896 |
Apparatus for UV flowable dielectric |
Nicholas Muga Ndiege, Patrick A. Van Cleemput, David Fang Wei Chen, Wenbo Liang, Shawn M. Hamilton |
2022-03-08 |
| 10388546 |
Apparatus for UV flowable dielectric |
Nicholas Muga Ndiege, Patrick A. Van Cleemput, David Fang Wei Chen, Wenbo Liang, Shawn M. Hamilton |
2019-08-20 |
| 9916977 |
Low k dielectric deposition via UV driven photopolymerization |
Patrick A. Van Cleemput, Nicholas Muga Ndiege |
2018-03-13 |
| 9728380 |
Dual-plenum showerhead with interleaved plenum sub-volumes |
Shawn M. Hamilton, Harald te Nijenhuis, Jeffrey E. Lorelli, Kevin Madrigal |
2017-08-08 |
| 9719169 |
System and apparatus for flowable deposition in semiconductor fabrication |
Harald te Nijenhuis, Shawn M. Hamilton, Kevin Madrigal, Ramkishan Rao Lingampalli |
2017-08-01 |
| 9184072 |
Advanced multi-workpiece processing chamber |
Daniel J. Devine, Charles Crapuchettes, Dixit V. Desai, Rene George, Vincent Lee +4 more |
2015-11-10 |
| 9121097 |
Variable showerhead flow by varying internal baffle conductance |
Shawn M. Hamilton, Harald te Nijenhuis, Jeffrey E. Lorelli, Kevin Madrigal |
2015-09-01 |
| 7972444 |
Workpiece support with fluid zones for temperature control |
Martin L. Zucker, Daniel J. Devine, Vladimir Nagorny |
2011-07-05 |
| 7369297 |
Mirror structure with single crystal silicon cross-member |
Brian K. McGinley, Howard Woo |
2008-05-06 |
| 7355781 |
Spatial light modulator with perforated hinge |
— |
2008-04-08 |
| 7042619 |
Mirror structure with single crystal silicon cross-member |
Brian K. McGinley, Howard Woo |
2006-05-09 |
| 7011039 |
Multi-purpose processing chamber with removable chamber liner |
John Joseph Helmsen, Michael Barnes |
2006-03-14 |
| 6598615 |
Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber |
John Holland, Michael Barnes, Steve S. Y. Mak, Patrick Leahey |
2003-07-29 |
| 6401652 |
Plasma reactor inductive coil antenna with flat surface facing the plasma |
Arthur H. Sato, Kien N. Chuc |
2002-06-11 |
| 6379575 |
Treatment of etching chambers using activated cleaning gas |
Gerald Yin, Xue-Yu Qian, Patrick Leahey, Waiching Chow, Arthur Y. Chen +2 more |
2002-04-30 |
| 6095084 |
High density plasma process chamber |
Shamouil Shamouilian, Ananda H. Kumar, Arnold Kholodenko, Dennis S. Grimard, Michael G. Chafin +1 more |
2000-08-01 |
