Issued Patents All Time
Showing 1–25 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879044 | Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing | Yuhou Wang, Ying Wu, Alexander Paterson | 2020-12-29 |
| 10679825 | Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate | Ying Wu, Alex Paterson, John Drewery | 2020-06-09 |
| 10438775 | Methods for automatically determining capacitor values and systems thereof | — | 2019-10-08 |
| 10431426 | Gas plenum arrangement for improving etch non-uniformity in transformer-coupled plasma systems | Tom A. Kamp, Alex Paterson | 2019-10-01 |
| 10347464 | Cycle-averaged frequency tuning for low power voltage mode operation | — | 2019-07-09 |
| 10332725 | Systems and methods for reversing RF current polarity at one output of a multiple output RF matching network | Maolin Long, Alex Paterson | 2019-06-25 |
| 10319570 | Determining a malfunctioning device in a plasma system | John C. Valcore, Jr., Bradford J. Lyndaker | 2019-06-11 |
| 10297422 | Systems and methods for calibrating conversion models and performing position conversions of variable capacitors in match networks of plasma processing systems | — | 2019-05-21 |
| 10134570 | Radiofrequency adjustment for instability management in semiconductor processing | — | 2018-11-20 |
| 9997381 | Hybrid edge ring for plasma wafer processing | Brian McMillin, Neil Benjamin | 2018-06-12 |
| 9620337 | Determining a malfunctioning device in a plasma system | John C. Valcore, Jr., Bradford J. Lyndaker | 2017-04-11 |
| 9484214 | Systems and methods for improving wafer etch non-uniformity when using transformer-coupled plasma | Tom A. Kamp, Alex Paterson | 2016-11-01 |
| 9412670 | System, method and apparatus for RF power compensation in plasma etch chamber | Robert Griffith O'Neill, Eric Tonnis, Seetharaman Ramachandran, Shang-I Chou | 2016-08-09 |
| 9322795 | Electrode for use in measuring dielectric properties of parts | Jaehyun Kim, Keith Comendant, Qing Liu, Feiyang Wu | 2016-04-26 |
| 9083182 | Bypass capacitors for high voltage bias power in the mid frequency RF range | — | 2015-07-14 |
| 9059101 | Radiofrequency adjustment for instability management in semiconductor processing | — | 2015-06-16 |
| 8828259 | Methods for automatically determining capacitor values and systems thereof | — | 2014-09-09 |
| 8736175 | Current control in plasma processing systems | Maolin Long, Seyed Jafar Jafarian-Tehrani, Neil Benjamin, Norman Williams | 2014-05-27 |
| 8692467 | Synchronized and shortened master-slave RF pulsing in a plasma processing chamber | Neil Benjamin | 2014-04-08 |
| 8597428 | Vacuum sealing radio frequency (RF) and low frequency conducting actuator | Danny Brown, Allan K. Ronne, John Daugherty, Leonard J. Sharpless | 2013-12-03 |
| 8519724 | Electrode for use in measuring dielectric properties of parts | Jaehyun Kim, Keith Comendant, Qing Liu, Feiyang Wu | 2013-08-27 |
| 8269510 | Apparatus for measuring dielectric properties of parts | Jaehyun Kim, Keith Comendant, Qing Liu, Feiyang Wu | 2012-09-18 |
| 7973539 | Methods for measuring dielectric properties of parts | Jaehyun Kim, Keith Comendant, Qing Liu, Feiyang Wu | 2011-07-05 |
| 7911213 | Methods for measuring dielectric properties of parts | Jaehyun Kim, Keith Comendant, Qing Liu, Feiyang Wu | 2011-03-22 |
| 7777500 | Methods for characterizing dielectric properties of parts | Jaehyun Kim, Keith Comendant, Qing Liu, Feiyang Wu | 2010-08-17 |