Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6504126 | Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions | Xue-Yu Qian | 2003-01-07 |
| 6472822 | Pulsed RF power delivery for plasma processing | Jin-Yuan Chen, John Holland, Valentin N. Todorow | 2002-10-29 |
| 6447636 | Plasma reactor with dynamic RF inductive and capacitive coupling control | Xue-Yu Qian, Zhi-Wen Sun, Maocheng Li, John Holland, Valentin Todorov +2 more | 2002-09-10 |
| 6447637 | Process chamber having a voltage distribution electrode | Valentin Todorov, Robert E. Ryan, Jin-Yuan Chen, Xueyu Qian, Zhiwen Sun | 2002-09-10 |
| 6401652 | Plasma reactor inductive coil antenna with flat surface facing the plasma | Jonathan D. Mohn, Kien N. Chuc | 2002-06-11 |
| 6373022 | Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry | Xue-Yu Qian | 2002-04-16 |
| 6369349 | Plasma reactor with coil antenna of interleaved conductors | Xue-Yu Qian | 2002-04-09 |
| 6369348 | Plasma reactor with coil antenna of plural helical conductors with equally spaced ends | Xue-Yu Qian | 2002-04-09 |
| 6356097 | Capacitive probe for in situ measurement of wafer DC bias voltage | Peter Loewenhardt, Valentin Todorov | 2002-03-12 |
| 6352049 | Plasma assisted processing chamber with separate control of species density | Gerald Yin, Arnold Kolandenko, Hong Ching Shan, Peter Loewenhardt, Chii Guang Lee +9 more | 2002-03-05 |
| 6297468 | Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal | Xue-Yu Qian | 2001-10-02 |
| 6291793 | Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal | Xue-Yu Qian | 2001-09-18 |
| 6016131 | Inductively coupled plasma reactor with an inductive coil antenna having independent loops | Xue-Yu Qian | 2000-01-18 |
| 5942889 | Capacitive probe for in situ measurement of wafer DC bias voltage | Peter Loewenhardt, Valentin Todorov | 1999-08-24 |
| 5919382 | Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor | Xue-Yu Qian | 1999-07-06 |
| 5907221 | Inductively coupled plasma reactor with an inductive coil antenna having independent loops | Xue-Yu Qian | 1999-05-25 |
| 5801386 | Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same | Valentin Todorov, Yoshi Tanase, Xue-Yu Qian, Peter Loewenhardt, Yan Ye +2 more | 1998-09-01 |
| 5683539 | Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling | Xue-Yu Qian | 1997-11-04 |
| 5667701 | Method of measuring the amount of capacitive coupling of RF power in an inductively coupled plasma | Xue-Yu Qian | 1997-09-16 |
| 5565074 | Plasma reactor with a segmented balanced electrode for sputtering process materials from a target surface | Xue-Yu Qian | 1996-10-15 |