Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7777152 | High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck | Michael D. Willwerth, Alexander Paterson, Brian K. Hatcher, James E. Sammons, III, John Holland | 2010-08-17 |
| 7718538 | Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates | Tae Won Kim, Kyeong-Tae Lee, Alexander Paterson, Shashank Deshmukh | 2010-05-18 |
| 7678710 | Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system | Thai Cheng Chua, Steven C. H. Hung, Patricia M. Liu, Tatsuya Sato, Alex Paterson +1 more | 2010-03-16 |
| 7674394 | Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution | Alexander Paterson, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +1 more | 2010-03-09 |
| 7552736 | Process for wafer backside polymer removal with a ring of plasma under the wafer | Kenneth S. Collins, Hiroji Hanawa, Andrew Nguyen, Ajit Balakrishna, David Palagashvili +7 more | 2009-06-30 |
| 6962644 | Tandem etch chamber plasma processing system | Alexander Paterson, Jon McChesney, Gerhard Schneider, David Palagashvili, John Holland +1 more | 2005-11-08 |
| 6706138 | Adjustable dual frequency voltage dividing plasma reactor | Michael Barnes, John Holland, Alexander Paterson, Farhad Moghadam | 2004-03-16 |
| 6660127 | Apparatus for plasma etching at a constant etch rate | Padmapani Nallan, John Holland, Thorsten Lill | 2003-12-09 |
| 6617794 | Method for controlling etch uniformity | Michael Barnes, John Holland, Mohit Jain, Alexander Paterson | 2003-09-09 |
| 6507155 | Inductively coupled plasma source with controllable power deposition | Michael Barnes, John Holland | 2003-01-14 |
| 6447636 | Plasma reactor with dynamic RF inductive and capacitive coupling control | Xue-Yu Qian, Zhi-Wen Sun, Maocheng Li, John Holland, Arthur H. Sato +2 more | 2002-09-10 |
| 6447637 | Process chamber having a voltage distribution electrode | Robert E. Ryan, Arthur H. Sato, Jin-Yuan Chen, Xueyu Qian, Zhiwen Sun | 2002-09-10 |
| 6399507 | Stable plasma process for etching of films | Padmapani Nallan, John Holland, Thorsten Lill | 2002-06-04 |
| 6356097 | Capacitive probe for in situ measurement of wafer DC bias voltage | Peter Loewenhardt, Arthur H. Sato | 2002-03-12 |
| 5942889 | Capacitive probe for in situ measurement of wafer DC bias voltage | Peter Loewenhardt, Arthur H. Sato | 1999-08-24 |
| 5801386 | Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same | Yoshi Tanase, Xue-Yu Qian, Arthur H. Sato, Peter Loewenhardt, Yan Ye +2 more | 1998-09-01 |