| 7777152 |
High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck |
Michael D. Willwerth, Alexander Paterson, Brian K. Hatcher, James E. Sammons, III, John Holland |
2010-08-17 |
| 7718538 |
Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates |
Tae Won Kim, Kyeong-Tae Lee, Alexander Paterson, Shashank Deshmukh |
2010-05-18 |
| 7678710 |
Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system |
Thai Cheng Chua, Steven C. H. Hung, Patricia M. Liu, Tatsuya Sato, Alex Paterson +1 more |
2010-03-16 |
| 7674394 |
Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution |
Alexander Paterson, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +1 more |
2010-03-09 |
| 7552736 |
Process for wafer backside polymer removal with a ring of plasma under the wafer |
Kenneth S. Collins, Hiroji Hanawa, Andrew Nguyen, Ajit Balakrishna, David Palagashvili +7 more |
2009-06-30 |
| 6962644 |
Tandem etch chamber plasma processing system |
Alexander Paterson, Jon McChesney, Gerhard Schneider, David Palagashvili, John Holland +1 more |
2005-11-08 |
| 6706138 |
Adjustable dual frequency voltage dividing plasma reactor |
Michael Barnes, John Holland, Alexander Paterson, Farhad Moghadam |
2004-03-16 |
| 6660127 |
Apparatus for plasma etching at a constant etch rate |
Padmapani Nallan, John Holland, Thorsten Lill |
2003-12-09 |
| 6617794 |
Method for controlling etch uniformity |
Michael Barnes, John Holland, Mohit Jain, Alexander Paterson |
2003-09-09 |
| 6507155 |
Inductively coupled plasma source with controllable power deposition |
Michael Barnes, John Holland |
2003-01-14 |
| 6447636 |
Plasma reactor with dynamic RF inductive and capacitive coupling control |
Xue-Yu Qian, Zhi-Wen Sun, Maocheng Li, John Holland, Arthur H. Sato +2 more |
2002-09-10 |
| 6447637 |
Process chamber having a voltage distribution electrode |
Robert E. Ryan, Arthur H. Sato, Jin-Yuan Chen, Xueyu Qian, Zhiwen Sun |
2002-09-10 |
| 6399507 |
Stable plasma process for etching of films |
Padmapani Nallan, John Holland, Thorsten Lill |
2002-06-04 |
| 6356097 |
Capacitive probe for in situ measurement of wafer DC bias voltage |
Peter Loewenhardt, Arthur H. Sato |
2002-03-12 |
| 5942889 |
Capacitive probe for in situ measurement of wafer DC bias voltage |
Peter Loewenhardt, Arthur H. Sato |
1999-08-24 |
| 5801386 |
Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same |
Yoshi Tanase, Xue-Yu Qian, Arthur H. Sato, Peter Loewenhardt, Yan Ye +2 more |
1998-09-01 |
