Issued Patents All Time
Showing 25 most recent of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405164 | Spatial optical emission spectroscopy for etch uniformity | Blake Erickson, Keith R. Berding, Michael Kutney, Zhaozhao Zhu, Tsung Feng Wu +1 more | 2025-09-02 |
| 12163911 | Capacitive sensor housing for chamber condition monitoring | Yaoling Pan, Patrick Tae, Leonard Tedeschi, Daniel T. McCormick | 2024-12-10 |
| 12130561 | Gas distribution plate with UV blocker | Kartik Ramaswamy, Yang Yang | 2024-10-29 |
| 12068135 | Fast gas exchange apparatus, system, and method | Ming Xu, Ashley M. Okada, Duc Dang Buckius, Jeffrey Ludwig, Aditi MITHUN +1 more | 2024-08-20 |
| 12009236 | Sensors and system for in-situ edge ring erosion monitor | Yaoling Pan, Patrick Tae, Leonard Tedeschi, Daniel Sang Byun, Philip Allan Kraus +5 more | 2024-06-11 |
| 12009191 | Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall | Patrick Tae, Blake Erickson, Zhaozhao Zhu, Barry Craver | 2024-06-11 |
| 11668602 | Spatial optical emission spectroscopy for etch uniformity | Blake Erickson, Keith R. Berding, Michael Kutney, Zhaozhao Zhu, Tsung Feng Wu +1 more | 2023-06-06 |
| 11581206 | Capacitive sensor for chamber condition monitoring | Yaoling Pan, Patrick Tae, Leonard Tedeschi, Jennifer Y. Sun, Philip Allan Kraus +6 more | 2023-02-14 |
| 11551905 | Resonant process monitor | Yaoling Pan, Vijaykumar Krithivasan, Shimin Mao, Kelvin Chan, Anantha K. Subramani +5 more | 2023-01-10 |
| 11545346 | Capacitive sensing data integration for plasma chamber condition monitoring | Yaoling Pan, Patrick Tae, Leonard Tedeschi, Kiyki-Shiy Shang, Mikhail Taraboukhine +2 more | 2023-01-03 |
| 11448977 | Gas distribution plate with UV blocker at the center | Kartik Ramaswamy, Yang Yang | 2022-09-20 |
| 11415538 | Capacitive sensor housing for chamber condition monitoring | Yaoling Pan, Patrick Tae, Leonard Tedeschi, Daniel T. McCormick | 2022-08-16 |
| 11387135 | Conductive wafer lift pin o-ring gripper with resistor | Roberto Cesar Cotlear | 2022-07-12 |
| 11264252 | Chamber lid with integrated heater | Jeffrey Ludwig, Benjamin Schwarz, Roberto Cesar Cotlear | 2022-03-01 |
| D931240 | Substrate support pedestal | Changhun Lee, Jeffrey Ludwig | 2021-09-21 |
| 11094511 | Processing chamber with substrate edge enhancement processing | Changhun Lee, Valentin N. Todorow, Hean Cheal Lee, Hun Sang Kim | 2021-08-17 |
| 10790180 | Electrostatic chuck with variable pixelated magnetic field | Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Ankur Agarwal +2 more | 2020-09-29 |
| 10770269 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom Choi +3 more | 2020-09-08 |
| 10770329 | Gas flow for condensation reduction with a substrate processing chuck | Hun Sang Kim | 2020-09-08 |
| 10490435 | Cooling element for an electrostatic chuck assembly | Roberto Cesar Cotlear, Andreas Schmid | 2019-11-26 |
| 10460968 | Electrostatic chuck with variable pixelated magnetic field | Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Ankur Agarwal +2 more | 2019-10-29 |
| 10290469 | Enhanced plasma source for a plasma reactor | Valentin N. Todorow, Gary Leray, Li-Sheng Chiang | 2019-05-14 |
| 10283397 | Substrate lift pin actuator | Roberto Cesar Cotlear | 2019-05-07 |
| 10257887 | Substrate support assembly | Alexander Matyushkin, Dan Katz, John Holland, Theodoros Panagopoulos | 2019-04-09 |
| 10186444 | Gas flow for condensation reduction with a substrate processing chuck | Hun Sang Kim | 2019-01-22 |