| 12437979 |
Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring |
Yaoling Pan, Patrick Tae, Leonard Tedeschi, Philip Allan Kraus |
2025-10-07 |
|
| 12405164 |
Spatial optical emission spectroscopy for etch uniformity |
Blake Erickson, Keith R. Berding, Michael Kutney, Zhaozhao Zhu, Tsung Feng Wu +1 more |
2025-09-02 |
|
| 12163911 |
Capacitive sensor housing for chamber condition monitoring |
Yaoling Pan, Patrick Tae, Leonard Tedeschi, Daniel T. McCormick |
2024-12-10 |
$69,596,000 |
| 12130561 |
Gas distribution plate with UV blocker |
Kartik Ramaswamy, Yang Yang |
2024-10-29 |
$69,228,000 |
| 12068135 |
Fast gas exchange apparatus, system, and method |
Ming Xu, Ashley M. Okada, Duc Dang Buckius, Jeffrey Ludwig, Aditi MITHUN +1 more |
2024-08-20 |
$94,413,000 |
| 12009236 |
Sensors and system for in-situ edge ring erosion monitor |
Yaoling Pan, Patrick Tae, Leonard Tedeschi, Daniel Sang Byun, Philip Allan Kraus +5 more |
2024-06-11 |
$84,570,000 |
| 12009191 |
Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wall |
Patrick Tae, Blake Erickson, Zhaozhao Zhu, Barry Craver |
2024-06-11 |
$84,570,000 |
| 11668602 |
Spatial optical emission spectroscopy for etch uniformity |
Blake Erickson, Keith R. Berding, Michael Kutney, Zhaozhao Zhu, Tsung Feng Wu +1 more |
2023-06-06 |
$40,761,000 |
| 11581206 |
Capacitive sensor for chamber condition monitoring |
Yaoling Pan, Patrick Tae, Leonard Tedeschi, Jennifer Y. Sun, Philip Allan Kraus +6 more |
2023-02-14 |
$35,617,000 |
| 11551905 |
Resonant process monitor |
Yaoling Pan, Vijaykumar Krithivasan, Shimin Mao, Kelvin Chan, Anantha K. Subramani +5 more |
2023-01-10 |
$14,061,000 |
| 11545346 |
Capacitive sensing data integration for plasma chamber condition monitoring |
Yaoling Pan, Patrick Tae, Leonard Tedeschi, Kiyki-Shiy Shang, Mikhail Taraboukhine +2 more |
2023-01-03 |
$39,123,000 |
| 11448977 |
Gas distribution plate with UV blocker at the center |
Kartik Ramaswamy, Yang Yang |
2022-09-20 |
$25,949,000 |
| 11415538 |
Capacitive sensor housing for chamber condition monitoring |
Yaoling Pan, Patrick Tae, Leonard Tedeschi, Daniel T. McCormick |
2022-08-16 |
$38,686,000 |
| 11387135 |
Conductive wafer lift pin o-ring gripper with resistor |
Roberto Cesar Cotlear |
2022-07-12 |
$30,931,000 |
| 11264252 |
Chamber lid with integrated heater |
Jeffrey Ludwig, Benjamin Schwarz, Roberto Cesar Cotlear |
2022-03-01 |
$41,046,000 |
| D931240 |
Substrate support pedestal |
Changhun Lee, Jeffrey Ludwig |
2021-09-21 |
|
| 11094511 |
Processing chamber with substrate edge enhancement processing |
Changhun Lee, Valentin N. Todorow, Hean Cheal Lee, Hun Sang Kim |
2021-08-17 |
$63,158,000 |
| 10790180 |
Electrostatic chuck with variable pixelated magnetic field |
Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Ankur Agarwal +2 more |
2020-09-29 |
$24,138,000 |
| 10770269 |
Apparatus and methods for reducing particles in semiconductor process chambers |
Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom Choi +3 more |
2020-09-08 |
$22,964,000 |
| 10770329 |
Gas flow for condensation reduction with a substrate processing chuck |
Hun Sang Kim |
2020-09-08 |
$22,964,000 |
| 10490435 |
Cooling element for an electrostatic chuck assembly |
Roberto Cesar Cotlear, Andreas Schmid |
2019-11-26 |
$24,423,000 |
| 10460968 |
Electrostatic chuck with variable pixelated magnetic field |
Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Ankur Agarwal +2 more |
2019-10-29 |
$23,960,000 |
| 10290469 |
Enhanced plasma source for a plasma reactor |
Valentin N. Todorow, Gary Leray, Li-Sheng Chiang |
2019-05-14 |
$40,982,000 |
| 10283397 |
Substrate lift pin actuator |
Roberto Cesar Cotlear |
2019-05-07 |
$13,988,000 |
| 10257887 |
Substrate support assembly |
Alexander Matyushkin, Dan Katz, John Holland, Theodoros Panagopoulos |
2019-04-09 |
$19,096,000 |
