Issued Patents All Time
Showing 26–50 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10083816 | Shielded lid heater assembly | David Palagashvili, Valentin N. Todorow, Stephen Yuen | 2018-09-25 |
| 9948214 | High temperature electrostatic chuck with real-time heat zone regulating capability | Dmitry Lubomirsky, Jennifer Y. Sun, Sehn Thach, Xing Lin, Konstantin Makhratchev | 2018-04-17 |
| 9883549 | Substrate support assembly having rapid temperature control | Alexander Matyushkin, Dan Katz, John Holland, Theodoros Panagopoulos | 2018-01-30 |
| 9761416 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Tom K. Cho +3 more | 2017-09-12 |
| 9443753 | Apparatus for controlling the flow of a gas in a process chamber | David Palagashvili, Jingbao Liu | 2016-09-13 |
| 9362148 | Shielded lid heater assembly | David Palagashvili, Valentin N. Todorow, Stephen Yuen | 2016-06-07 |
| 9275887 | Substrate processing with rapid temperature gradient control | Alexander Matyushkin, Dan Katz, John Holland, Theodoros Panagopoulos | 2016-03-01 |
| 9070536 | Plasma reactor electrostatic chuck with cooled process ring and heated workpiece support surface | David Palagashvili, Michael G. Chafin, Ying-Sheng Lin | 2015-06-30 |
| 8840725 | Chamber with uniform flow and plasma distribution | David Palagashvili, ALEX ERENSTEIN, Jingbao Liu | 2014-09-23 |
| 8801896 | Method and apparatus for stable plasma processing | Valentin N. Todorow, John Holland | 2014-08-12 |
| 8771423 | Low sloped edge ring for plasma processing chamber | Changhun Lee, Hoan Nguyen | 2014-07-08 |
| 8757603 | Low force substrate lift | David Palagashvili | 2014-06-24 |
| 8501626 | Methods for high temperature etching a high-K material gate structure | Wei Liu, Eiichi Matsusue, Meihua Shen, Shashank Deshmukh, Anh Phan +4 more | 2013-08-06 |
| 8419893 | Shielded lid heater assembly | David Palagashvili, Valentin N. Todorow, Stephen Yuen | 2013-04-16 |
| 8383002 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, David Palagashvili, Valentin N. Todorow, Alexander Paterson | 2013-02-26 |
| 8349128 | Method and apparatus for stable plasma processing | Valentin N. Todorow, John Holland | 2013-01-08 |
| 8299391 | Field enhanced inductively coupled plasma (Fe-ICP) reactor | Valentin N. Todorow, Samer Banna, Kartik Ramaswamy | 2012-10-30 |
| 8287650 | Low sloped edge ring for plasma processing chamber | Changhun Lee, Hoan Hguyen | 2012-10-16 |
| 8270141 | Electrostatic chuck with reduced arcing | David Palagashvili, Douglas A. Buchberger, Jr., Michael G. Chafin | 2012-09-18 |
| 8075728 | Gas flow equalizer plate suitable for use in a substrate process chamber | Ajit Balakrishna, Shahid Rauf, Andrew Nguyen, Valentin N. Todorow | 2011-12-13 |
| 7879250 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, David Palagashvili, Valentin N. Todorow, Alexander Paterson | 2011-02-01 |
| 7832354 | Cathode liner with wafer edge gas injection in a plasma reactor chamber | Dan Katz, David Palagashvili, Valentin N. Todorow, Alexander Paterson | 2010-11-16 |
| 7777152 | High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck | Valentin Todorov, Alexander Paterson, Brian K. Hatcher, James E. Sammons, III, John Holland | 2010-08-17 |
| 7602484 | Method and apparatus for performing limited area spectral analysis | Matthew F. Davis, Lei Lian, Yasuhiro Uo, Andrei Ivanovich Netchitaliouk | 2009-10-13 |
| 7330244 | Method and apparatus for performing limited area spectral analysis | Matthew F. Davis, Lei Lian, Yasuhiro Uo, Andrei Ivanovich Netchitaliouk | 2008-02-12 |