Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8858766 | Combinatorial high power coaxial switching matrix | Kent Riley Child | 2014-10-14 |
| 8236133 | Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias | Dan Katz, David Palagashvili, Theodoros Panagopoulos, Valentin N. Todorow, Edward P. Hammond, IV +2 more | 2012-08-07 |
| 8066895 | Method to control uniformity using tri-zone showerhead | Rodolfo P. Belen, Edward P. Hammond, IV, Dan Katz, Alexander Paterson, Valentin N. Todorow | 2011-11-29 |
| 8017526 | Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process | Edward P. Hammond, IV, Rodolfo P. Belen, Alexander Paterson, Valentin N. Todorow, Dan Katz | 2011-09-13 |
| 7780864 | Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution | Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +2 more | 2010-08-24 |
| 7777152 | High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck | Valentin Todorov, Michael D. Willwerth, Alexander Paterson, James E. Sammons, III, John Holland | 2010-08-17 |
| 7727413 | Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density | Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +2 more | 2010-06-01 |
| 7674394 | Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution | Alexander Paterson, Valentin Todorov, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +1 more | 2010-03-09 |
| 7645357 | Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency | Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +2 more | 2010-01-12 |
| 7264688 | Plasma reactor apparatus with independent capacitive and toroidal plasma sources | Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Dan Katz, Edward P. Hammond, IV +2 more | 2007-09-04 |
| 6379575 | Treatment of etching chambers using activated cleaning gas | Gerald Yin, Xue-Yu Qian, Patrick Leahey, Jonathan D. Mohn, Waiching Chow +2 more | 2002-04-30 |
| 6367410 | Closed-loop dome thermal control apparatus for a semiconductor wafer processing system | Patrick Leahey, Jerry Chen, Richard E. Remington, Simon Yavelberg, Timothy D. Driscoll +3 more | 2002-04-09 |