Issued Patents All Time
Showing 25 most recent of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12237148 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more | 2025-02-25 |
| 11848176 | Plasma processing using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +3 more | 2023-12-19 |
| 11776789 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more | 2023-10-03 |
| 11462389 | Pulsed-voltage hardware assembly for use in a plasma processing system | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +5 more | 2022-10-04 |
| 11462388 | Plasma processing assembly using pulsed-voltage and radio-frequency power | Leonid Dorf, Rajinder Dhindsa, James Rogers, Daniel Sang Byun, Evgeny Kamenetskiy +4 more | 2022-10-04 |
| 11177115 | Dual-level pulse tuning | Gary Leray, James Rogers | 2021-11-16 |
| 11094511 | Processing chamber with substrate edge enhancement processing | Changhun Lee, Michael D. Willwerth, Hean Cheal Lee, Hun Sang Kim | 2021-08-17 |
| 10991552 | Cooling mechanism utilized in a plasma reactor with enhanced temperature regulation | Aniruddha Pal, Victor Calderon, Martin Jeffrey Salinas | 2021-04-27 |
| 10825708 | Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability | Samer Banna, Imad Yousif, Albert Wang, Gary Leray | 2020-11-03 |
| 10573493 | Inductively coupled plasma apparatus | Samer Banna, Ankur Agarwal, Zhigang Chen, TSE-CHIANG WANG, Andrew Nguyen +2 more | 2020-02-25 |
| 10553398 | Power deposition control in inductively coupled plasma (ICP) reactors | Samer Banna, Tza-Jing Gung, Vladimir Knyazik, Kyle Tantiwong, Dan Marohl +1 more | 2020-02-04 |
| 10546731 | Method, apparatus and system for wafer dechucking using dynamic voltage sweeping | Haitao Wang, Michael G. Chafin, Kartik Ramaswamy, Yue Guo, Kenny L. Doan +3 more | 2020-01-28 |
| 10290469 | Enhanced plasma source for a plasma reactor | Gary Leray, Michael D. Willwerth, Li-Sheng Chiang | 2019-05-14 |
| 10271416 | High efficiency triple-coil inductively coupled plasma source with phase control | Samer Banna, Waheb Bishara, Ryan Giar, Dmitry Lubomirsky, Kyle Tantiwong | 2019-04-23 |
| 10249475 | Cooling mechanism utlized in a plasma reactor with enhanced temperature regulation | Aniruddha Pal, Victor Calderon, Martin Jeffrey Salinas | 2019-04-02 |
| 10083816 | Shielded lid heater assembly | Michael D. Willwerth, David Palagashvili, Stephen Yuen | 2018-09-25 |
| 9945033 | High efficiency inductively coupled plasma source with customized RF shield for plasma profile control | Samer Banna, Vladimir Knyazik, Waheb Bishara | 2018-04-17 |
| 9595423 | Frequency tuning for dual level radio frequency (RF) pulsing | Gary Leray | 2017-03-14 |
| 9406540 | Self-bias calculation on a substrate in a process chamber with bias power for single or multiple frequencies | Gary Leray, Samer Banna | 2016-08-02 |
| 9378930 | Inductively coupled plasma reactor having RF phase control and methods of use thereof | Michael N. Grimbergen, Alan Ouye | 2016-06-28 |
| 9362148 | Shielded lid heater assembly | Michael D. Willwerth, David Palagashvili, Stephen Yuen | 2016-06-07 |
| 9318304 | Frequency tuning for dual level radio frequency (RF) pulsing | Gary Leray | 2016-04-19 |
| 8988848 | Extended and independent RF powered cathode substrate for extreme edge tunability | Samer Banna, Imad Yousif, Albert Wang, Gary Leray | 2015-03-24 |
| 8956500 | Methods to eliminate “M-shape” etch rate profile in inductively coupled plasma reactor | Stephen Yuen, Kyeong-Tae Lee, Tae Won Kim, Anisul Khan, Shashank Deshmukh | 2015-02-17 |
| 8933628 | Inductively coupled plasma source with phase control | Samer Banna, Zhigang Chen | 2015-01-13 |