Issued Patents All Time
Showing 26–50 of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8801896 | Method and apparatus for stable plasma processing | John Holland, Michael D. Willwerth | 2014-08-12 |
| 8773020 | Apparatus for forming a magnetic field and methods of use thereof | Gary Leray, Shahid Rauf | 2014-07-08 |
| 8633423 | Methods and apparatus for controlling substrate temperature in a process chamber | Xing Lin, Douglas A. Buchberger, Jr., Xiaoping Zhou, Andrew Nguyen, Anchel Sheyner | 2014-01-21 |
| 8492980 | Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system | Samer Banna, TSE-CHIANG WANG, Xing Lin | 2013-07-23 |
| 8419893 | Shielded lid heater assembly | Michael D. Willwerth, David Palagashvili, Stephen Yuen | 2013-04-16 |
| 8383002 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, David Palagashvili, Michael D. Willwerth, Alexander Paterson | 2013-02-26 |
| 8368308 | Inductively coupled plasma reactor having RF phase control and methods of use thereof | Samer Banna | 2013-02-05 |
| 8360003 | Plasma reactor with uniform process rate distribution by improved RF ground return path | Andrew Nguyen, Hiroji Hanawa, Kartik Ramaswamy, Samer Banna, Anchel Sheyner | 2013-01-29 |
| 8349128 | Method and apparatus for stable plasma processing | John Holland, Michael D. Willwerth | 2013-01-08 |
| 8299391 | Field enhanced inductively coupled plasma (Fe-ICP) reactor | Samer Banna, Kartik Ramaswamy, Michael D. Willwerth | 2012-10-30 |
| 8264154 | Method and apparatus for pulsed plasma processing using a time resolved tuning scheme for RF power delivery | Samer Banner, Kartik Ramaswamy | 2012-09-11 |
| 8236133 | Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias | Dan Katz, David Palagashvili, Brian K. Hatcher, Theodoros Panagopoulos, Edward P. Hammond, IV +2 more | 2012-08-07 |
| 8075728 | Gas flow equalizer plate suitable for use in a substrate process chamber | Ajit Balakrishna, Shahid Rauf, Andrew Nguyen, Michael D. Willwerth | 2011-12-13 |
| 8066895 | Method to control uniformity using tri-zone showerhead | Rodolfo P. Belen, Edward P. Hammond, IV, Brian K. Hatcher, Dan Katz, Alexander Paterson | 2011-11-29 |
| 8017526 | Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process | Edward P. Hammond, IV, Rodolfo P. Belen, Alexander Paterson, Brian K. Hatcher, Dan Katz | 2011-09-13 |
| 7967996 | Process for wafer backside polymer removal and wafer front side photoresist removal | Kenneth S. Collins, Hiroji Hanawa, Andrew Nguyen, Shahid Rauf, Ajit Balakrishna +6 more | 2011-06-28 |
| 7879250 | Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection | Dan Katz, David Palagashvili, Michael D. Willwerth, Alexander Paterson | 2011-02-01 |
| 7837838 | Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus | Thai Cheng Chua, Alex Paterson, Steven C. H. Hung, Patricia M. Liu, Tatsuya Sato +1 more | 2010-11-23 |
| 7832354 | Cathode liner with wafer edge gas injection in a plasma reactor chamber | Dan Katz, David Palagashvili, Michael D. Willwerth, Alexander Paterson | 2010-11-16 |
| 7780864 | Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution | Alexander Paterson, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2010-08-24 |
| 7771606 | Pulsed-plasma system with pulsed reaction gas replenish for etching semiconductors structures | Tae Won Kim, Kyeong-Tae Lee, Alexander Paterson, Shashank Deshmukh | 2010-08-10 |
| 7737042 | Pulsed-plasma system for etching semiconductor structures | Tae Won Kim, Kyeong-Tae Lee, Alexander Paterson, Shashank Deshmukh | 2010-06-15 |
| 7727413 | Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density | Alexander Paterson, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2010-06-01 |
| 7645710 | Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system | Christopher S. Olsen, Thai Cheng Chua, Steven C. H. Hung, Patricia M. Liu, Tatsuya Sato +2 more | 2010-01-12 |
| 7645357 | Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency | Alexander Paterson, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz, Edward P. Hammond, IV +2 more | 2010-01-12 |