| 12249250 |
System and method for extended spectrum ultrasound training using animate and inanimate training objects |
Eric Savitsky, Gabriele Nataneli |
2025-03-11 |
|
| 11631342 |
Embedded motion sensing technology for integration within commercial ultrasound probes |
Eric Savitsky, Gabriele Nataneli |
2023-04-18 |
|
| 11594150 |
System and method for extended spectrum ultrasound training using animate and inanimate training objects |
Eric Savitsky, Gabriele Nataneli |
2023-02-28 |
|
| 11315439 |
System and method for extended spectrum ultrasound training using animate and inanimate training objects |
Eric Savitsky, Gabriele Nataneli |
2022-04-26 |
|
| 11120709 |
System and method for teaching basic ultrasound skills |
Eric Savitsky, Gabriele Nataneli, Kresimir Petrinec |
2021-09-14 |
|
| 11062624 |
Embedded motion sensing technology for integration within commercial ultrasound probes |
Eric Savitsky, Gabriele Nataneli |
2021-07-13 |
|
| 10380920 |
System and method for augmented ultrasound simulation using flexible touch sensitive surfaces |
Eric Savitsky, Gabriele Nataneli |
2019-08-13 |
|
| 10380919 |
System and method for extended spectrum ultrasound training using animate and inanimate training objects |
Eric Savitsky, Gabriele Nataneli |
2019-08-13 |
|
| 10257887 |
Substrate support assembly |
Alexander Matyushkin, John Holland, Theodoros Panagopoulos, Michael D. Willwerth |
2019-04-09 |
$19,096,000 |
| 10026338 |
Embedded motion sensing technology for integration within commercial ultrasound probes |
Eric Savitsky, Gabriele Nataneli |
2018-07-17 |
|
| 9883549 |
Substrate support assembly having rapid temperature control |
Alexander Matyushkin, John Holland, Theodoros Panagopoulos, Michael D. Willwerth |
2018-01-30 |
$26,789,000 |
| 9870721 |
System and method for teaching basic ultrasound skills |
Eric Savitsky, Gabriele Nataneli, Kresimir Petrinec |
2018-01-16 |
|
| 9275887 |
Substrate processing with rapid temperature gradient control |
Alexander Matyushkin, John Holland, Theodoros Panagopoulos, Michael D. Willwerth |
2016-03-01 |
$12,540,000 |
| 8607731 |
Cathode with inner and outer electrodes at different heights |
Daniel J. Hoffman, Douglas A. Buchberger, Jr., Semyon L. Kats |
2013-12-17 |
$19,424,000 |
| 8383002 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection |
David Palagashvili, Michael D. Willwerth, Valentin N. Todorow, Alexander Paterson |
2013-02-26 |
$7,365,000 |
| 8297983 |
Multimodal ultrasound training system |
Eric Savitsky, Gabriele Nataneli, Kresimir Petrinec |
2012-10-30 |
|
| 8236133 |
Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias |
David Palagashvili, Brian K. Hatcher, Theodoros Panagopoulos, Valentin N. Todorow, Edward P. Hammond, IV +2 more |
2012-08-07 |
$10,850,000 |
| 8066895 |
Method to control uniformity using tri-zone showerhead |
Rodolfo P. Belen, Edward P. Hammond, IV, Brian K. Hatcher, Alexander Paterson, Valentin N. Todorow |
2011-11-29 |
$8,648,000 |
| 8017526 |
Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process |
Edward P. Hammond, IV, Rodolfo P. Belen, Alexander Paterson, Brian K. Hatcher, Valentin N. Todorow |
2011-09-13 |
$7,377,000 |
| 7879250 |
Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection |
David Palagashvili, Michael D. Willwerth, Valentin N. Todorow, Alexander Paterson |
2011-02-01 |
$7,897,000 |
| 7832354 |
Cathode liner with wafer edge gas injection in a plasma reactor chamber |
David Palagashvili, Michael D. Willwerth, Valentin N. Todorow, Alexander Paterson |
2010-11-16 |
$8,660,000 |
| 7780864 |
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution |
Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Edward P. Hammond, IV +2 more |
2010-08-24 |
$4,612,000 |
| 7727413 |
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density |
Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Edward P. Hammond, IV +2 more |
2010-06-01 |
$13,547,000 |
| 7674394 |
Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution |
Alexander Paterson, Valentin Todorov, Theodoros Panagopoulos, Brian K. Hatcher, Edward P. Hammond, IV +1 more |
2010-03-09 |
$8,227,000 |
| 7645357 |
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency |
Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Edward P. Hammond, IV +2 more |
2010-01-12 |
$28,444,000 |
