Issued Patents All Time
Showing 25 most recent of 90 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12300473 | Electrostatic chuck for high bias radio frequency (RF) power application in a plasma processing chamber | Jaeyong Cho, Peng Tian | 2025-05-13 |
| 12237149 | Reducing aspect ratio dependent etch with direct current bias pulsing | Deyang Li, Sunil Srinivasan, Yi-Chuan Chou, Kuan-Ting Liu, Jason A. Kenney +5 more | 2025-02-25 |
| 12080519 | Smart dynamic load simulator for RF power delivery control system | Jie Yu, Yue Guo, Kartik Ramaswamy, Tao Zhang, John C. Forster +2 more | 2024-09-03 |
| 11935724 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2024-03-19 |
| 11587766 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2023-02-21 |
| 11551965 | Apparatus to reduce polymers deposition | Andrew Nguyen, Xue Yang Chang, Jason A. Kenney | 2023-01-10 |
| 11315760 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2022-04-26 |
| 11189502 | Showerhead with interlaced gas feed and removal and methods of use | Kallol Bera, James D. Carducci, Vladimir Knyazik, Anantha K. Subramani | 2021-11-30 |
| 11114284 | Plasma reactor with electrode array in ceiling | Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Kallol Bera | 2021-09-07 |
| 11101113 | Ion-ion plasma atomic layer etch process | Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Leonid Dorf, Yang Yang | 2021-08-24 |
| 11043361 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, James D. Carducci, Kenneth S. Collins +3 more | 2021-06-22 |
| 10811226 | Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates | James D. Carducci, Kenneth S. Collins, Richard Fovell, Jason A. Kenney, Kartik Ramaswamy | 2020-10-20 |
| 10790180 | Electrostatic chuck with variable pixelated magnetic field | Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Ankur Agarwal, Vijay D. Parkhe +2 more | 2020-09-29 |
| 10770269 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Ajit Balakrishna, Tom Choi, Kenneth S. Collins +3 more | 2020-09-08 |
| 10615006 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-04-07 |
| 10586718 | Cooling base with spiral channels for ESC | Vladimir Knyazik, Stephen Prouty, Roland Smith, Denis M. Koosau | 2020-03-10 |
| 10580620 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-03-03 |
| 10573493 | Inductively coupled plasma apparatus | Valentin N. Todorow, Samer Banna, Ankur Agarwal, Zhigang Chen, TSE-CHIANG WANG +2 more | 2020-02-25 |
| 10546728 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-01-28 |
| 10535502 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2020-01-14 |
| 10510515 | Processing tool with electrically switched electrode assembly | Kenneth S. Collins, Kartik Ramaswamy, Kallol Bera, James D. Carducci, Michael R. Rice +1 more | 2019-12-17 |
| 10475626 | Ion-ion plasma atomic layer etch process and reactor | Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Leonid Dorf, Yang Yang | 2019-11-12 |
| 10460968 | Electrostatic chuck with variable pixelated magnetic field | Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Ankur Agarwal, Vijay D. Parkhe +2 more | 2019-10-29 |
| 10453656 | Symmetric plasma process chamber | James D. Carducci, Hamid Tavassoli, Ajit Balakrishna, Zhigang Chen, Andrew Nguyen +3 more | 2019-10-22 |
| 10386126 | Apparatus for controlling temperature uniformity of a substrate | Kallol Bera, Xiaoping Zhou, Douglas A. Buchberger, Jr., Andrew Nguyen, Hamid Tavassoli +1 more | 2019-08-20 |