| 12400845 |
Ion energy control on electrodes in a plasma reactor |
Yue Guo, Haitao Wang, Kartik Ramaswamy |
2025-08-26 |
|
| 12368020 |
Pulsed voltage source for plasma processing applications |
A N M Wasekul AZAD, Kartik Ramaswamy, Yue Guo, Fernando Silveira |
2025-07-22 |
|
| 12347647 |
Plasma excitation with ion energy control |
Yue Guo, Kartik Ramaswamy |
2025-07-01 |
|
| 12334304 |
System and methods for implementing a micro pulsing scheme using dual independent pulsers |
A N M Wasekul AZAD, Kartik Ramaswamy, Yue Guo, Nicolas Bright |
2025-06-17 |
|
| 12334383 |
Substrate support gap pumping to prevent glow discharge and light-up |
James D. Carducci, Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, Silverst Rodrigues |
2025-06-17 |
|
| 12293897 |
Radio frequency diverter assembly enabling on-demand different spatial |
Kartik Ramaswamy, Yue Guo, A N M Wasekul AZAD, Nicolas Bright |
2025-05-06 |
|
| 12272524 |
Wideband variable impedance load for high volume manufacturing qualification and on-site diagnostics |
Yue Guo, Kartik Ramaswamy, Jie Yu |
2025-04-08 |
|
| 12266506 |
Scanning impedance measurement in a radio frequency plasma processing chamber |
Yue Guo, Kartik Ramaswamy, Nicolas Bright, A N M Wasekul AZAD |
2025-04-01 |
|
| 12261019 |
Voltage pulse time-domain multiplexing |
Kartik Ramaswamy, Yue Guo |
2025-03-25 |
|
| 12205797 |
Solid-state switch based high-speed pulser with plasma IEDF modification capability through multilevel output functionality |
Kartik Ramaswamy, Yue Guo, Fernando Silveira, A. N. M. Wasekul Azad |
2025-01-21 |
|
| 12195830 |
Aluminum alloy, preparation method, and aluminum alloy structural member |
Qiang Guo, Xiaodong Wang, Mengjue Liao |
2025-01-14 |
|
| 12136537 |
Cost effective radio frequency impedance matching networks |
Yue Guo, Kartik Ramaswamy, Farhad Moghadam |
2024-11-05 |
$79,202,000 |
| 12130561 |
Gas distribution plate with UV blocker |
Kartik Ramaswamy, Michael D. Willwerth |
2024-10-29 |
$69,228,000 |
| 12125689 |
Methods and apparatus for toroidal plasma generation |
Kartik Ramaswamy, Andrew Nguyen, Sathya Swaroop Ganta, Fernando Silveira, Yue Guo +1 more |
2024-10-22 |
$83,950,000 |
| 12111341 |
In-situ electric field detection method and apparatus |
Yue Guo, Kartik Ramaswamy, Fernando Silveira, A N M Wasekul AZAD |
2024-10-08 |
$69,128,000 |
| 12106938 |
Distortion current mitigation in a radio frequency plasma processing chamber |
Yue Guo, Kartik Ramaswamy |
2024-10-01 |
$68,865,000 |
| 12046449 |
Methods and apparatus for processing a substrate |
Yue Guo, Katsumasa Kawasaki, Kartik Ramaswamy, Nicolas Bright |
2024-07-23 |
$84,339,000 |
| 12020901 |
RF impedance matching networks for substrate processing platform |
Yue Guo, Krishna Kumar Kuttannair, Jie Yu, Kartik Ramaswamy |
2024-06-25 |
$57,214,000 |
| 11972924 |
Pulsed voltage source for plasma processing applications |
A N M Wasekul AZAD, Kartik Ramaswamy, Yue Guo, Fernando Silveira |
2024-04-30 |
$79,776,000 |
| 11967483 |
Plasma excitation with ion energy control |
Yue Guo, Kartik Ramaswamy |
2024-04-23 |
$64,043,000 |
| 11823868 |
Hardware switch on main feed line in a radio frequency plasma processing chamber |
Yue Guo, Kartik Ramaswamy |
2023-11-21 |
$39,416,000 |
| 11810760 |
Apparatus and method of ion current compensation |
Yue Guo, Kartik Ramaswamy |
2023-11-07 |
$37,048,000 |
| 11784042 |
Carbon hard masks for patterning applications and methods related thereto |
Eswaranand Venkatasubramanian, Pramit Manna, Kartik Ramaswamy, Takehito Koshizawa, Abhijit Basu Mallick |
2023-10-10 |
$39,034,000 |
| 11776788 |
Pulsed voltage boost for substrate processing |
Yue Guo, Kartik Ramaswamy |
2023-10-03 |
$34,462,000 |
| 11721525 |
Sensorless RF impedance matching network |
Yue Guo, Kartik Ramaswamy |
2023-08-08 |
$46,911,000 |
