Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12334358 | Integration processes utilizing boron-doped silicon materials | Karthik Janakiraman, Rui Cheng, Krishna Nittala, Menghui Li, Ming-Yuan Chuang +8 more | 2025-06-17 |
| 12198936 | Defect free germanium oxide gap fill | Huiyuan Wang, Susmit Singha Roy, Bo Qi, Abhijit Basu Mallick | 2025-01-14 |
| 12183578 | Method for forming and patterning a layer and/or substrate | Rui Cheng, Tejinder Singh, Hidetaka Oshio | 2024-12-31 |
| 12148475 | Selection gate separation for 3D NAND | Chang-Seok Kang, Tomohiko Kitajima, Gill Yong Lee, Qian Fu, Sung-Kwan Kang +1 more | 2024-11-19 |
| 12033848 | Processes for depositing sib films | Aykut Aydin, Rui Cheng, Karthik Janakiraman, Abhijit Basu Mallick, Bo Qi | 2024-07-09 |
| 12018364 | Super-conformal germanium oxide films | Huiyuan Wang, Susmit Singha Roy, Bo Qi, Abhijit Basu Mallick | 2024-06-25 |
| 11791155 | Diffusion barriers for germanium | Huiyuan Wang, Susmit Singha Roy, Bo Qi, Abhijit Basu Mallick, Nitin K. Ingle | 2023-10-17 |
| 11781218 | Defect free germanium oxide gap fill | Huiyuan Wang, Susmit Singha Roy, Bo Qi, Abhijit Basu Mallick | 2023-10-10 |
| 11784042 | Carbon hard masks for patterning applications and methods related thereto | Eswaranand Venkatasubramanian, Yang Yang, Pramit Manna, Kartik Ramaswamy, Abhijit Basu Mallick | 2023-10-10 |
| 11638374 | Multicolor approach to DRAM STI active cut patterning | Tejinder Singh, Abhijit Basu Mallick, Pramit Manna, Nancy Fung, Eswaranand Venkatasubramanian +2 more | 2023-04-25 |
| 11638377 | Self-aligned select gate cut for 3D NAND | — | 2023-04-25 |
| 11603591 | Pulsed plasma (DC/RF) deposition of high quality C films for patterning | Eswaranand Venkatasubramanian, Yang Yang, Pramit Manna, Kartik Ramaswamy, Abhijit Basu Mallick | 2023-03-14 |
| 11545504 | Methods and apparatus for three dimensional NAND structure fabrication | Mukund Srinivasan, Tomohiko Kitajima, Chang-Seok Kang, Sung-Kwan Kang, Gill Yong Lee +1 more | 2023-01-03 |
| 11469097 | Carbon hard masks for patterning applications and methods related thereto | Eswaranand Venkatasubramanian, Yang Yang, Pramit Manna, Kartik Ramaswamy, Abhijit Basu Mallick | 2022-10-11 |
| 11430801 | Methods and apparatus for three dimensional NAND structure fabrication | Mukund Srinivasan, Tomohiko Kitajima, Chang-Seok Kang, Sung-Kwan Kang, Gill Yong Lee +1 more | 2022-08-30 |
| 11335690 | Multicolor approach to DRAM STI active cut patterning | Tejinder Singh, Abhijit Basu Mallick, Pramit Manna, Nancy Fung, Eswaranand Venkatasubramanian +2 more | 2022-05-17 |
| 11145509 | Method for forming and patterning a layer and/or substrate | Rui Cheng, Tejinder Singh, Hidetaka Oshio | 2021-10-12 |
| 11043372 | High-density low temperature carbon films for hardmask and other patterning applications | Eswaranand Venkatasubramanian, Samuel E. Gottheim, Yang Yang, Pramit Manna, Kartik Ramaswamy +2 more | 2021-06-22 |
| 10998329 | Methods and apparatus for three dimensional NAND structure fabrication | Mukund Srinivasan, Tomohiko Kitajima, Chang-Seok Kang, Sung-Kwan Kang, Gill Yong Lee +1 more | 2021-05-04 |
| 10954129 | Diamond-like carbon as mandrel | Eswaranand Venkatasubramanian, Pramit Manna, Chi-Pin Lu, Chi-I Lang, Nancy Fung +1 more | 2021-03-23 |
| 10910381 | Multicolor approach to DRAM STI active cut patterning | Tejinder Singh, Abhijit Basu Mallick, Pramit Manna, Nancy Fung, Eswaranand Venkatasubramanian +2 more | 2021-02-02 |
| 10403502 | Boron doped tungsten carbide for hardmask applications | Eswaranand Venkatasubramanian, Abhijit Basu Mallick, Susmit Singha Roy | 2019-09-03 |
| 9508561 | Methods for forming interconnection structures in an integrated cluster system for semicondcutor applications | Mehul Naik, Srinivas D. Nemani, He Ren | 2016-11-29 |
| 9385028 | Air gap process | Srinivas D. Nemani | 2016-07-05 |